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1998 3
1999 3
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2002 1
2003 8
2004 4
2005 5
2006 7
2007 10
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2024 1

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Page 1
Promotion of resin bonding to dental zirconia ceramic using plasma deposition of tetramethylsilane and benzene.
Han GJ, Kim JH, Cho BH, Oh KH, Jeong JJ. Han GJ, et al. Eur J Oral Sci. 2017 Feb;125(1):81-87. doi: 10.1111/eos.12316. Epub 2016 Nov 16. Eur J Oral Sci. 2017. PMID: 27859654
A total of 70 zirconia specimens, which were polished before sintering, were randomly divided into five groups according to surface treatments before applying a dental adhesive (each group, n = 14): group 1, no previous treatment (control); group 2, plasma deposition with tetr …
A total of 70 zirconia specimens, which were polished before sintering, were randomly divided into five groups according to surface treatmen …
Auto-Oxidation of a Volatile Silicon Compound: A Theoretical Study of the Atmospheric Chemistry of Tetramethylsilane.
Ren Z, da Silva G. Ren Z, et al. J Phys Chem A. 2020 Aug 13;124(32):6544-6551. doi: 10.1021/acs.jpca.0c02922. Epub 2020 Jul 6. J Phys Chem A. 2020. PMID: 32567312
Volatile silicon compounds (VOSiCs) are air pollutants present in both indoor and outdoor environments. Here, tetramethylsilane (TMS) is selected as a model to study the photochemical oxidation mechanisms for VOSiCs using ab initio and RRKM theory/master equation kinetic m …
Volatile silicon compounds (VOSiCs) are air pollutants present in both indoor and outdoor environments. Here, tetramethylsilane (TMS) …
High-pressure study of tetramethylsilane by Raman spectroscopy.
Qin ZX, Zhang JB, Troyan I, Palasyuk T, Eremets M, Chen XJ. Qin ZX, et al. J Chem Phys. 2012 Jan 14;136(2):024503. doi: 10.1063/1.3676720. J Chem Phys. 2012. PMID: 22260599
High-pressure behavior of tetramethylsilane, one of the Group IVa hydrides, was investigated by Raman scattering measurements at pressures up to 142 GPa and room temperature. ...We also observed two other possible phase transitions at 49-69 GPa and 96 GPa. No indication of …
High-pressure behavior of tetramethylsilane, one of the Group IVa hydrides, was investigated by Raman scattering measurements at pres …
[Separation and identification of impurities from intermediates of istradefylline].
Wang Y, Lü X, Xu H, Meng Z, Li J, Xu Z, Xue M. Wang Y, et al. Se Pu. 2021 Apr 8;39(4):430-436. doi: 10.3724/SP.J.1123.2020.10013. Se Pu. 2021. PMID: 34227764 Free PMC article. Chinese.
In MS experiments, an electrospray ionization (ESI) source was used with positive ion scanning. In the NMR experiments, we used tetramethylsilane (TMS) as the internal standard and deuterated dimethyl sulfoxide (DMSO-d(6)) as the solvent to obtain the spectra. ...
In MS experiments, an electrospray ionization (ESI) source was used with positive ion scanning. In the NMR experiments, we used tetrameth …
A Study of Trimethylsilane (3MS) and Tetramethylsilane (4MS) Based alpha-SiCN:H/alpha-SiCO:H Diffusion Barrier Films.
Chen SW, Wang YS, Hu SY, Lee WH, Chi CC, Wang YL. Chen SW, et al. Materials (Basel). 2012 Mar 2;5(3):377-384. doi: 10.3390/ma5030377. Materials (Basel). 2012. PMID: 28817052 Free PMC article.
In this study, the etching stop layers were deposited by using trimethylsilane (3MS) or tetramethylsilane (4MS) with ammonia by plasma-enhanced chemical vapor deposition (PECVD) followed by a procedure for tetra-ethoxyl silane (TEOS) oxide. ...
In this study, the etching stop layers were deposited by using trimethylsilane (3MS) or tetramethylsilane (4MS) with ammonia by plasm …
(1)H, (13)C and (29)Si magnetic shielding in gaseous and liquid tetramethylsilane.
Makulski W, Jackowski K. Makulski W, et al. J Magn Reson. 2020 Apr;313:106716. doi: 10.1016/j.jmr.2020.106716. Epub 2020 Mar 23. J Magn Reson. 2020. PMID: 32213448
Tetramethylsilane (TMS) is well-known as a reference standard of (1)H, (13)C and (29)Si NMR chemical shifts. ...
Tetramethylsilane (TMS) is well-known as a reference standard of (1)H, (13)C and (29)Si NMR chemical shifts. ...
Shock-tube study of the decomposition of tetramethylsilane using gas chromatography and high-repetition-rate time-of-flight mass spectrometry.
Sela P , Peukert S , Herzler J , Fikri M , Schulz C . Sela P , et al. Phys Chem Chem Phys. 2018 Apr 25;20(16):10686-10696. doi: 10.1039/c7cp06827a. Phys Chem Chem Phys. 2018. PMID: 29302654
The decomposition of tetramethylsilane was studied in shock-tube experiments in a temperature range of 1270-1580 K and pressures ranging from 1.5 to 2.3 bar behind reflected shock waves combining gas chromatography/mass spectrometry (GC/MS) and high-repetition-rate time-of …
The decomposition of tetramethylsilane was studied in shock-tube experiments in a temperature range of 1270-1580 K and pressures rang …
Mass Spectrometric Study on the Combustion of Tetramethylsilane and the Formation of Silicon Oxide Clusters in Premixed Laminar Low-Pressure Synthesis Flames.
Karakaya Y, Peukert S, Kasper T. Karakaya Y, et al. J Phys Chem A. 2018 Sep 13;122(36):7131-7141. doi: 10.1021/acs.jpca.8b06510. Epub 2018 Aug 30. J Phys Chem A. 2018. PMID: 30113832
This work investigates the decomposition of tetramethylsilane and the formation of silicon oxide clusters in a laminar premixed low-pressure hydrogen flame using molecular-beam mass spectrometry (MBMS). ...The measurements suggest that combustion of tetramethylsilane …
This work investigates the decomposition of tetramethylsilane and the formation of silicon oxide clusters in a laminar premixed low-p …
184 results