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Items: 5

1.

Structural and optical characterization of pure Si-rich nitride thin films.

Debieu O, Nalini RP, Cardin J, Portier X, Perrière J, Gourbilleau F.

Nanoscale Res Lett. 2013 Jan 16;8(1):31. doi: 10.1186/1556-276X-8-31.

2.

SiOx/SiNy multilayers for photovoltaic and photonic applications.

Nalini RP, Khomenkova L, Debieu O, Cardin J, Dufour C, Carrada M, Gourbilleau F.

Nanoscale Res Lett. 2012 Feb 14;7:124. doi: 10.1186/1556-276X-7-124.

3.

Electromagnetic modeling of waveguide amplifier based on Nd3+ Si-rich SiO2 layers by means of the ADE-FDTD method.

Dufour C, Cardin J, Debieu O, Fafin A, Gourbilleau F.

Nanoscale Res Lett. 2011 Apr 4;6(1):278. doi: 10.1186/1556-276X-6-278.

4.

Electrical behavior of MIS devices based on Si nanoclusters embedded in SiOxNy and SiO2 films.

Jacques E, Pichon L, Debieu O, Gourbilleau F.

Nanoscale Res Lett. 2011 Feb 24;6(1):170. doi: 10.1186/1556-276X-6-170.

5.

Effect of the Nd content on the structural and photoluminescence properties of silicon-rich silicon dioxide thin films.

Debieu O, Cardin J, Portier X, Gourbilleau F.

Nanoscale Res Lett. 2011 Feb 21;6(1):161. doi: 10.1186/1556-276X-6-161.

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