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Adv Mater. 2012 Apr 17;24(15):1952-5. doi: 10.1002/adma.201103532. Epub 2012 Mar 21.

Tailoring nanostructures using copolymer nanoimprint lithography.

Author information

1
CEA, IRAMIS, SIS2M LIONS, CNRS, UMR n° 3299, Gif-sur-Yvette Cedex, France.

Abstract

The generation of defect-free polymer nanostructures by nanoimprinting methods is described. Long-range nanorheology and shorter-range surface energy effects can be efficiently combined to provide alignment of copolymer lamellae over several micrometers. As an example, a perpendicular organization with respect to circular tracks is shown, demonstrating the possibility of writing ordered radial nanostructures over large distances.

PMID:
22434566
DOI:
10.1002/adma.201103532
[Indexed for MEDLINE]

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