Send to

Choose Destination

Links from PubMed

See comment in PubMed Commons below
Opt Express. 2010 Sep 13;18(19):19485-94. doi: 10.1364/OE.18.019485.

Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect.

Author information

Fraunhofer Institut für Angewandte Optik und Feinmechanik IOF, Jena, Germany.


The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithography in a mask aligner. A novel illumination system, referred to as MO Exposure Optics, allows to control the effective source shape and accordingly the angular spectrum of the illumination light. Pinhole array photomasks are employed to generate periodic high-resolution diffraction patterns by means of self-imaging. They create a demagnified image of the effective source geometry in their diffraction pattern which is printed to photoresist. The proposed method comprises high flexibility and sub-micron resolution at large proximity gaps. Various periodic structures have been generated and are presented.

[Indexed for MEDLINE]
PubMed Commons home

PubMed Commons

How to join PubMed Commons

    Supplemental Content

    Full text links

    Icon for Optical Society of America
    Loading ...
    Support Center