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Items: 1 to 20 of 102

1.

Learning-based compressive sensing method for EUV lithographic source optimization.

Lin J, Dong L, Fan T, Ma X, Wei Y, Ye T.

Opt Express. 2019 Aug 5;27(16):22563-22581. doi: 10.1364/OE.27.022563.

PMID:
31510546
2.

Inverse lithography source optimization via compressive sensing.

Song Z, Ma X, Gao J, Wang J, Li Y, Arce GR.

Opt Express. 2014 Jun 16;22(12):14180-98. doi: 10.1364/OE.22.014180.

PMID:
24977516
3.

Fast optical proximity correction method based on nonlinear compressive sensing.

Ma X, Wang Z, Li Y, Arce GR, Dong L, Garcia-Frias J.

Opt Express. 2018 May 28;26(11):14479-14498. doi: 10.1364/OE.26.014479.

PMID:
29877485
4.

Lithographic source optimization based on adaptive projection compressive sensing.

Ma X, Shi D, Wang Z, Li Y, Arce GR.

Opt Express. 2017 Mar 20;25(6):7131-7149. doi: 10.1364/OE.25.007131.

PMID:
28381053
5.

Fast nonlinear compressive sensing lithographic source and mask optimization method using Newton-IHTs algorithm.

Sun Y, Sheng N, Li T, Li Y, Li E, Wei P.

Opt Express. 2019 Feb 4;27(3):2754-2770. doi: 10.1364/OE.27.002754.

PMID:
30732308
6.

Gradient-based inverse extreme ultraviolet lithography.

Ma X, Wang J, Chen X, Li Y, Arce GR.

Appl Opt. 2015 Aug 20;54(24):7284-300. doi: 10.1364/AO.54.007284.

PMID:
26368764
7.

Optimization of lithography source illumination arrays using diffraction subspaces.

Ma X, Wang Z, Lin H, Li Y, Arce GR, Zhang L.

Opt Express. 2018 Feb 19;26(4):3738-3755. doi: 10.1364/OE.26.003738.

PMID:
29475354
8.

Learning to sense sparse signals: simultaneous sensing matrix and sparsifying dictionary optimization.

Duarte-Carvajalino JM, Sapiro G.

IEEE Trans Image Process. 2009 Jul;18(7):1395-408. doi: 10.1109/TIP.2009.2022459. Epub 2009 Jun 2.

PMID:
19497818
9.

Blind compressive sensing dynamic MRI.

Lingala SG, Jacob M.

IEEE Trans Med Imaging. 2013 Jun;32(6):1132-45. doi: 10.1109/TMI.2013.2255133. Epub 2013 Mar 27.

10.

Regularized spherical polar fourier diffusion MRI with optimal dictionary learning.

Cheng J, Jiang T, Deriche R, Shen D, Yap PT.

Med Image Comput Comput Assist Interv. 2013;16(Pt 1):639-46.

PMID:
24505721
11.

Learning discriminative dictionary for group sparse representation.

Sun Y, Liu Q, Tang J, Tao D.

IEEE Trans Image Process. 2014 Sep;23(9):3816-28. doi: 10.1109/TIP.2014.2331760. Epub 2014 Jun 18.

PMID:
24956370
12.

New laser plasma source for extreme-ultraviolet lithography.

Jin F, Richardson M.

Appl Opt. 1995 Sep 1;34(25):5750-60. doi: 10.1364/AO.34.005750.

PMID:
21060408
13.

Jointly Using Low-Rank and Sparsity Priors for Sparse Inverse Synthetic Aperture Radar Imaging.

Qiu W, Zhou J, Fu Q.

IEEE Trans Image Process. 2020;29:100-115. doi: 10.1109/TIP.2019.2927458. Epub 2019 Jul 15.

PMID:
31329559
14.

Hyperspectral imagery super-resolution by compressive sensing inspired dictionary learning and spatial-spectral regularization.

Huang W, Xiao L, Liu H, Wei Z.

Sensors (Basel). 2015 Jan 19;15(1):2041-58. doi: 10.3390/s150102041.

15.

Manifold optimization-based analysis dictionary learning with an ℓ1∕2-norm regularizer.

Li Z, Ding S, Li Y, Yang Z, Xie S, Chen W.

Neural Netw. 2018 Feb;98:212-222. doi: 10.1016/j.neunet.2017.11.015. Epub 2017 Dec 6.

PMID:
29272726
16.

Co-optimization method to reduce the pattern distortion caused by polarization aberration in anamorphic EUV lithography.

Sheng N, Sun Y, Li E, Li T, Li Y, Wei P, Liu L.

Appl Opt. 2019 May 10;58(14):3718-3728. doi: 10.1364/AO.58.003718.

PMID:
31158182
17.

Low-dose CT reconstruction via L1 dictionary learning regularization using iteratively reweighted least-squares.

Zhang C, Zhang T, Li M, Peng C, Liu Z, Zheng J.

Biomed Eng Online. 2016 Jun 18;15(1):66. doi: 10.1186/s12938-016-0193-y.

18.

Model-driven convolution neural network for inverse lithography.

Ma X, Zhao Q, Zhang H, Wang Z, Arce GR.

Opt Express. 2018 Dec 10;26(25):32565-32584. doi: 10.1364/OE.26.032565.

PMID:
30645421
19.

Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas.

Zhao HY, Zhao HW, Sun LT, Zhang XZ, Wang H, Ma BH, Li XX, Zhu YH, Sheng LS, Zhang GB, Tian YC.

Rev Sci Instrum. 2008 Feb;79(2 Pt 2):02C719. doi: 10.1063/1.2814258.

PMID:
18315272
20.

Fast resist-activation dosimetry for extreme ultra-violet lithography.

Heo J, Xu M, Maas D.

Opt Express. 2017 Mar 6;25(5):4621-4631. doi: 10.1364/OE.25.004621.

PMID:
28380733

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