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Items: 1 to 20 of 116

1.

Patterning of supported gold monolayers via chemical lift-off lithography.

Slaughter LS, Cheung KM, Kaappa S, Cao HH, Yang Q, Young TD, Serino AC, Malola S, Olson JM, Link S, Häkkinen H, Andrews AM, Weiss PS.

Beilstein J Nanotechnol. 2017 Dec 8;8:2648-2661. doi: 10.3762/bjnano.8.265. eCollection 2017.

2.

Double-Sided Opportunities Using Chemical Lift-Off Lithography.

Andrews AM, Liao WS, Weiss PS.

Acc Chem Res. 2016 Aug 16;49(8):1449-57. doi: 10.1021/acs.accounts.6b00034. Epub 2016 Apr 11.

3.

Subtractive patterning via chemical lift-off lithography.

Liao WS, Cheunkar S, Cao HH, Bednar HR, Weiss PS, Andrews AM.

Science. 2012 Sep 21;337(6101):1517-21.

4.

Large-area patterning of coinage-metal thin films using decal transfer lithography.

Childs WR, Nuzzo RG.

Langmuir. 2005 Jan 4;21(1):195-202.

PMID:
15620303
5.

Large-Area, Ultrathin Metal-Oxide Semiconductor Nanoribbon Arrays Fabricated by Chemical Lift-Off Lithography.

Zhao C, Xu X, Bae SH, Yang Q, Liu W, Belling JN, Cheung KM, Rim YS, Yang Y, Andrews AM, Weiss PS.

Nano Lett. 2018 Sep 12;18(9):5590-5595. doi: 10.1021/acs.nanolett.8b02054. Epub 2018 Aug 6.

6.

Controlled DNA Patterning by Chemical Lift-Off Lithography: Matrix Matters.

Cao HH, Nakatsuka N, Serino AC, Liao WS, Cheunkar S, Yang H, Weiss PS, Andrews AM.

ACS Nano. 2015 Nov 24;9(11):11439-54. doi: 10.1021/acsnano.5b05546. Epub 2015 Oct 6.

PMID:
26426585
7.

Lift-off patterning of thin Au films on Si surfaces with atomic force microscopy

Moon WC, Yoshinobu T, Iwasaki H.

Ultramicroscopy. 2000 Feb;82(1-4):119-23.

PMID:
10741660
8.

Polymer-Pen Chemical Lift-Off Lithography.

Xu X, Yang Q, Cheung KM, Zhao C, Wattanatorn N, Belling JN, Abendroth JM, Slaughter LS, Mirkin CA, Andrews AM, Weiss PS.

Nano Lett. 2017 May 10;17(5):3302-3311. doi: 10.1021/acs.nanolett.7b01236. Epub 2017 Apr 25.

PMID:
28409640
9.

Self-Collapse Lithography.

Zhao C, Xu X, Yang Q, Man T, Jonas SJ, Schwartz JJ, Andrews AM, Weiss PS.

Nano Lett. 2017 Aug 9;17(8):5035-5042. doi: 10.1021/acs.nanolett.7b02269. Epub 2017 Jul 31.

PMID:
28737930
10.

Patterning of layer-by-layer assembled organic-inorganic hybrid films: imprinting versus lift-off.

Chen X, Sun J, Shen J.

Langmuir. 2009 Mar 3;25(5):3316-20. doi: 10.1021/la804133w.

PMID:
19437792
11.

Comparison of chemical lithography using alkanethiolate self-assembled monolayers on GaAs (001) and Au.

Zhou C, Trionfi A, Jones JC, Hsu JW, Walker AV.

Langmuir. 2010 Mar 16;26(6):4523-8. doi: 10.1021/la9033029.

PMID:
20000435
12.

Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch(2).

Huang C, Förste A, Walheim S, Schimmel T.

Beilstein J Nanotechnol. 2015 May 26;6:1205-11. doi: 10.3762/bjnano.6.123. eCollection 2015.

13.

Patterned Au/poly(dimethylsiloxane) substrate fabricated by chemical plating coupled with electrochemical etching for cell patterning.

Bai HJ, Shao ML, Gou HL, Xu JJ, Chen HY.

Langmuir. 2009 Sep 1;25(17):10402-7. doi: 10.1021/la900944c.

PMID:
19415913
14.

Building upon patterned organic monolayers produced via catalytic stamp lithography.

Mizuno H, Buriak JM.

ACS Appl Mater Interfaces. 2010 Aug;2(8):2301-7. doi: 10.1021/am100348f.

PMID:
20735101
15.
17.

Patterning of various silicon structures via polymer lithography and catalytic chemical etching.

Lee JP, Bang BM, Choi S, Kim T, Park S.

Nanotechnology. 2011 Jul 8;22(27):275305. doi: 10.1088/0957-4484/22/27/275305. Epub 2011 May 20.

PMID:
21597138
18.

Wafer-scale bioactive substrate patterning by chemical lift-off lithography.

Chen CY, Wang CM, Li HH, Chan HH, Liao WS.

Beilstein J Nanotechnol. 2018 Jan 26;9:311-320. doi: 10.3762/bjnano.9.31. eCollection 2018.

19.

Controllable and facile fabrication of gold nanostructures for selective metal-assisted etching of silicon.

Zhang X, Zhu J, Huang X, Qian Q, He Y, Chi L, Wang Y.

Small. 2014 Jun 25;10(12):2451-8. doi: 10.1002/smll.201400087. Epub 2014 Mar 5.

PMID:
24599660

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