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Items: 1 to 20 of 137

1.
2.

Research on laser-induced damage resistance of fused silica optics by the fluid jet polishing method.

Lv L, Ma P, Huang J, He X, Cai C, Zhu H.

Appl Opt. 2016 Mar 20;55(9):2252-8. doi: 10.1364/AO.55.002252.

PMID:
27140559
3.

Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers.

Ye H, Li Y, Zhang Q, Wang W, Yuan Z, Wang J, Xu Q.

Appl Opt. 2016 Apr 10;55(11):3017-25. doi: 10.1364/AO.55.003017.

PMID:
27139869
4.

Reaction ion etching process for improving laser damage resistance of fused silica optical surface.

Sun L, Liu H, Huang J, Ye X, Xia H, Li Q, Jiang X, Wu W, Yang L, Zheng W.

Opt Express. 2016 Jan 11;24(1):199-211. doi: 10.1364/OE.24.000199.

PMID:
26832251
5.

Effects of combined process of reactive ion etching and dynamic chemical etching on UV laser damage resistance and surface quality of fused silica optics.

Sun L, Huang J, Shao T, Ye X, Li Q, Jiang X, Wu W, Yang L, Zheng W.

Opt Express. 2018 Jul 9;26(14):18006-18018. doi: 10.1364/OE.26.018006.

PMID:
30114081
6.

Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces.

Sun L, Huang J, Liu H, Ye X, Wu J, Jiang X, Yang L, Zheng W, Wu W.

Opt Lett. 2016 Oct 1;41(19):4464-4467. doi: 10.1364/OL.41.004464.

PMID:
27749856
7.

Imprinting high-gradient topographical structures onto optical surfaces using magnetorheological finishing: manufacturing corrective optical elements for high-power laser applications.

Menapace JA, Ehrmann PE, Bayramian AJ, Bullington A, Di Nicola JM, Haefner C, Jarboe J, Marshall C, Schaffers KI, Smith C.

Appl Opt. 2016 Jul 1;55(19):5240-8. doi: 10.1364/AO.55.005240.

PMID:
27409216
8.

Enhancement of CsLiB(6)O(10) surface-damage resistance by improved crystallinity and ion-beam etching.

Kamimura T, Fukumoto S, Ono R, Yap YK, Yoshimura M, Mori Y, Sasaki T, Yoshida K.

Opt Lett. 2002 Apr 15;27(8):616-8.

PMID:
18007880
9.

Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.

Shi F, Zhong Y, Dai Y, Peng X, Xu M, Sui T.

Opt Express. 2016 Sep 5;24(18):20842-54. doi: 10.1364/OE.24.020842.

PMID:
27607688
10.
11.

Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process.

Li Y, Yan H, Yang K, Yao C, Wang Z, Zou X, Yan C, Yuan X, Ju X, Yang L.

Sci Rep. 2017 Dec 19;7(1):17870. doi: 10.1038/s41598-017-18249-2.

12.

Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics.

Huang J, Wang F, Liu H, Geng F, Jiang X, Sun L, Ye X, Li Q, Wu W, Zheng W, Sun D.

Sci Rep. 2017 Nov 24;7(1):16239. doi: 10.1038/s41598-017-16467-2.

13.

Research of polishing process to control the iron contamination on the magnetorheological finished KDP crystal surface.

Chen S, Li S, Peng X, Hu H, Tie G.

Appl Opt. 2015 Feb 20;54(6):1478-84. doi: 10.1364/AO.54.001478.

PMID:
25968216
14.

Effects of deep wet etching in HF/HNO<sub>3</sub> and KOH solutions on the laser damage resistance and surface quality of fused silica optics at 351 nm.

Pfiffer M, Cormont P, Fargin E, Bousquet B, Dussauze M, Lambert S, Néauport J.

Opt Express. 2017 Mar 6;25(5):4607-4620. doi: 10.1364/OE.25.004607.

PMID:
28380732
15.

Observation and analysis of structural changes in fused silica by continuous irradiation with femtosecond laser light having an energy density below the laser-induced damage threshold.

Nomura W, Kawazoe T, Yatsui T, Naruse M, Ohtsu M.

Beilstein J Nanotechnol. 2014 Aug 21;5:1334-40. doi: 10.3762/bjnano.5.146. eCollection 2014.

16.

Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics.

Ye X, Huang J, Liu H, Geng F, Sun L, Jiang X, Wu W, Qiao L, Zu X, Zheng W.

Sci Rep. 2016 Aug 3;6:31111. doi: 10.1038/srep31111.

17.

Ultraviolet laser-induced damage on fused silica substrate and its sol-gel coating.

Li X, Gross M, Green K, Oreb B, Shen J.

Opt Lett. 2012 Jun 15;37(12):2364-6. doi: 10.1364/OL.37.002364.

PMID:
22739909
18.

Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process.

Sun L, Shao T, Shi Z, Huang J, Ye X, Jiang X, Wu W, Yang L, Zheng W.

Materials (Basel). 2018 Apr 10;11(4). pii: E577. doi: 10.3390/ma11040577.

19.

Belt-MRF for large aperture mirrors.

Ren K, Luo X, Zheng L, Bai Y, Li L, Hu H, Zhang X.

Opt Express. 2014 Aug 11;22(16):19262-76. doi: 10.1364/OE.22.019262.

PMID:
25321011
20.

Revision of laser-induced damage threshold evaluation from damage probability data.

Bataviciute G, Grigas P, Smalakys L, Melninkaitis A.

Rev Sci Instrum. 2013 Apr;84(4):045108. doi: 10.1063/1.4801955.

PMID:
23635233

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