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Items: 1 to 20 of 253

1.

Cobalt(III) diazabutadiene precursors for metal deposition: nanoparticle and thin film growth.

Pugh T, Cosham SD, Hamilton JA, Kingsley AJ, Johnson AL.

Inorg Chem. 2013 Dec 2;52(23):13719-29. doi: 10.1021/ic402317g. Epub 2013 Nov 15.

PMID:
24236689
2.

Cobalt(I) Olefin Complexes: Precursors for Metal-Organic Chemical Vapor Deposition of High Purity Cobalt Metal Thin Films.

Hamilton JA, Pugh T, Johnson AL, Kingsley AJ, Richards SP.

Inorg Chem. 2016 Jul 18;55(14):7141-51. doi: 10.1021/acs.inorgchem.6b01146. Epub 2016 Jun 27.

PMID:
27348614
3.

Tailoring precursors for deposition: synthesis, structure, and thermal studies of cyclopentadienylcopper(i) isocyanide complexes.

Willcocks AM, Pugh T, Cosham SD, Hamilton J, Sung SL, Heil T, Chalker PR, Williams PA, Kociok-Köhn G, Johnson AL.

Inorg Chem. 2015 May 18;54(10):4869-81. doi: 10.1021/acs.inorgchem.5b00448. Epub 2015 May 4.

PMID:
25938738
4.

CVD of pure copper films from novel iso-ureate complexes.

Willcocks AM, Pugh T, Hamilton JA, Johnson AL, Richards SP, Kingsley AJ.

Dalton Trans. 2013 Apr 21;42(15):5554-65. doi: 10.1039/c3dt00104k. Epub 2013 Feb 21.

PMID:
23425976
5.

Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid.

Kerrigan MM, Klesko JP, Rupich SM, Dezelah CL, Kanjolia RK, Chabal YJ, Winter CH.

J Chem Phys. 2017 Feb 7;146(5):052813. doi: 10.1063/1.4968848.

PMID:
28178839
6.

Titanium arsenide films from the atmospheric pressure chemical vapour deposition of tetrakisdimethylamidotitanium and tert-butylarsine.

Thomas T, Blackman CS, Parkin IP, Carmalt CJ.

Dalton Trans. 2011 Oct 28;40(40):10664-9. doi: 10.1039/c1dt10457h. Epub 2011 Jul 8.

PMID:
21743910
7.

Atmospheric-pressure plasma-enhanced chemical vapor deposition of a-SiCN:H films: role of precursors on the film growth and properties.

Guruvenket S, Andrie S, Simon M, Johnson KW, Sailer RA.

ACS Appl Mater Interfaces. 2012 Oct 24;4(10):5293-9. doi: 10.1021/am301157p. Epub 2012 Sep 28.

PMID:
22979919
8.

Structural evolution of nanocrystalline silicon thin films synthesized in high-density, low-temperature reactive plasmas.

Cheng Q, Xu S, Ostrikov KK.

Nanotechnology. 2009 May 27;20(21):215606. doi: 10.1088/0957-4484/20/21/215606. Epub 2009 May 6.

PMID:
19423937
9.
10.

Tris(phosphino)borato silver(I) complexes as precursors for metallic silver aerosol-assisted chemical vapor deposition.

McCain MN, Schneider S, Salata MR, Marks TJ.

Inorg Chem. 2008 Apr 7;47(7):2534-42. doi: 10.1021/ic701852x. Epub 2008 Feb 23.

PMID:
18293915
11.

Atomic layer deposition of tungsten(III) oxide thin films from W2(NMe2)6 and water: precursor-based control of oxidation state in the thin film material.

Dezelah CL 4th, El-Kadri OM, Szilágyi IM, Campbell JM, Arstila K, Niinistö L, Winter CH.

J Am Chem Soc. 2006 Aug 2;128(30):9638-9.

PMID:
16866511
12.

Atomic vapor deposition approach to In2O3 thin films.

Hellwig M, Parala H, Cybinksa J, Barreca D, Gasparotto A, Niermann B, Becker HW, Rogalla D, Feydt J, Irsen S, Mudring AV, Winter J, Fischer RA, Devi A.

J Nanosci Nanotechnol. 2011 Sep;11(9):8094-100.

PMID:
22097536
13.

New amidinate complexes of indium(iii): promising CVD precursors for transparent and conductive In2O3 thin films.

Gebhard M, Hellwig M, Kroll A, Rogalla D, Winter M, Mallick B, Ludwig A, Wiesing M, Wieck AD, Grundmeier G, Devi A.

Dalton Trans. 2017 Jun 8. doi: 10.1039/c7dt01280b. [Epub ahead of print]

PMID:
28594015
14.

Development of molecular precursors for deposition of indium sulphide thin film electrodes for photoelectrochemical applications.

Ehsan MA, Peiris TA, Wijayantha KG, Olmstead MM, Arifin Z, Mazhar M, Lo KM, McKee V.

Dalton Trans. 2013 Aug 14;42(30):10919-28. doi: 10.1039/c3dt50781e. Epub 2013 Jun 20.

PMID:
23787951
15.

Influence of precursors chemistry on ALD growth of cobalt-molybdenum oxide films.

Diskus M, Balasundaram M, Nilsen O, Fjellvåg H.

Dalton Trans. 2012 Feb 28;41(8):2439-44. doi: 10.1039/c2dt11837h. Epub 2012 Jan 4.

PMID:
22218742
16.

Iron thiobiurets: single-source precursors for iron sulfide thin films.

Ramasamy K, Malik MA, Helliwell M, Tuna F, O'Brien P.

Inorg Chem. 2010 Sep 20;49(18):8495-503. doi: 10.1021/ic1011204.

PMID:
20735018
17.

Growth characteristics of Ti-based fumaric acid hybrid thin films by molecular layer deposition.

Cao YQ, Zhu L, Li X, Cao ZY, Wu D, Li AD.

Dalton Trans. 2015 Sep 7;44(33):14782-92. doi: 10.1039/c5dt00384a.

PMID:
26219386
18.

Growth of TiO2 nanorods on a Ta substrate by metal-organic chemical vapor deposition.

Lee KS, Hyun JS, Seo HO, Kim YD, Boo JH.

J Nanosci Nanotechnol. 2010 May;10(5):3346-9.

PMID:
20358953
19.

Nanocomposite metal amorphous-carbon thin films deposited by hybrid PVD and PECVD technique.

Teixeira V, Soares P, Martins AJ, Carneiro J, Cerqueira F.

J Nanosci Nanotechnol. 2009 Jul;9(7):4061-6.

PMID:
19916409
20.

Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors.

Milanov AP, Xu K, Cwik S, Parala H, de los Arcos T, Becker HW, Rogalla D, Cross R, Paul S, Devi A.

Dalton Trans. 2012 Dec 7;41(45):13936-47. doi: 10.1039/c2dt31219k. Epub 2012 Oct 1.

PMID:
23023387

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