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Items: 1 to 20 of 105

1.

Sub-100-nm ordered silicon hole arrays by metal-assisted chemical etching.

Asoh H, Fujihara K, Ono S.

Nanoscale Res Lett. 2013 Oct 4;8(1):410. doi: 10.1186/1556-276X-8-410.

2.

Au-Capped GaAs Nanopillar Arrays Fabricated by Metal-Assisted Chemical Etching.

Asoh H, Imai R, Hashimoto H.

Nanoscale Res Lett. 2017 Dec;12(1):444. doi: 10.1186/s11671-017-2219-1. Epub 2017 Jul 5.

3.

Patterning of various silicon structures via polymer lithography and catalytic chemical etching.

Lee JP, Bang BM, Choi S, Kim T, Park S.

Nanotechnology. 2011 Jul 8;22(27):275305. doi: 10.1088/0957-4484/22/27/275305. Epub 2011 May 20.

PMID:
21597138
4.

Minimizing Isolate Catalyst Motion in Metal-Assisted Chemical Etching for Deep Trenching of Silicon Nanohole Array.

Kong L, Zhao Y, Dasgupta B, Ren Y, Hippalgaonkar K, Li X, Chim WK, Chiam SY.

ACS Appl Mater Interfaces. 2017 Jun 21;9(24):20981-20990. doi: 10.1021/acsami.7b04565. Epub 2017 Jun 8.

PMID:
28534611
5.

Lithography-free fabrication of silicon nanowire and nanohole arrays by metal-assisted chemical etching.

Liu R, Zhang F, Con C, Cui B, Sun B.

Nanoscale Res Lett. 2013 Apr 4;8(1):155. doi: 10.1186/1556-276X-8-155.

6.

Fabrication of porous silicon by metal-assisted etching using highly ordered gold nanoparticle arrays.

Scheeler SP, Ullrich S, Kudera S, Pacholski C.

Nanoscale Res Lett. 2012 Aug 9;7(1):450. doi: 10.1186/1556-276X-7-450.

7.
8.

Catalytic activity of noble metals for metal-assisted chemical etching of silicon.

Yae S, Morii Y, Fukumuro N, Matsuda H.

Nanoscale Res Lett. 2012 Jun 27;7(1):352. doi: 10.1186/1556-276X-7-352.

9.

Metal-assisted chemical etching of silicon: a review.

Huang Z, Geyer N, Werner P, de Boor J, Gösele U.

Adv Mater. 2011 Jan 11;23(2):285-308. doi: 10.1002/adma.201001784. Review.

PMID:
20859941
10.

Metal assisted anodic etching of silicon.

Lai CQ, Zheng W, Choi WK, Thompson CV.

Nanoscale. 2015 Jul 7;7(25):11123-34. doi: 10.1039/c5nr01916h. Epub 2015 Jun 10.

PMID:
26059556
11.

Ordered arrays of vertically aligned [110] silicon nanowires by suppressing the crystallographically preferred <100> etching directions.

Huang Z, Shimizu T, Senz S, Zhang Z, Zhang X, Lee W, Geyer N, Gösele U.

Nano Lett. 2009 Jul;9(7):2519-25. doi: 10.1021/nl803558n.

PMID:
19480399
12.

The fabrication of large-scale sub-10-nm core-shell silicon nanowire arrays.

Su S, Lin L, Li Z, Feng J, Zhang Z.

Nanoscale Res Lett. 2013 Oct 1;8(1):405. doi: 10.1186/1556-276X-8-405.

13.

Design guideline of Si nanohole/PEDOT:PSS hybrid structure for solar cell application.

Hong L, Rusli, Wang X, Zheng H, Wang H, Yu H.

Nanotechnology. 2013 Sep 6;24(35):355301. doi: 10.1088/0957-4484/24/35/355301. Epub 2013 Aug 12.

PMID:
23940111
14.

Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (>50:1) silicon pillar arrays by nanoimprint and etching.

Morton KJ, Nieberg G, Bai S, Chou SY.

Nanotechnology. 2008 Aug 27;19(34):345301. doi: 10.1088/0957-4484/19/34/345301. Epub 2008 Jul 15.

PMID:
21730643
15.

Graphene-Assisted Chemical Etching of Silicon Using Anodic Aluminum Oxides as Patterning Templates.

Kim J, Lee DH, Kim JH, Choi SH.

ACS Appl Mater Interfaces. 2015 Nov 4;7(43):24242-6. doi: 10.1021/acsami.5b07773. Epub 2015 Oct 22.

PMID:
26473800
16.

Highly ordered hexagonally arranged nanostructures on silicon through a self-assembled silicon-integrated porous anodic alumina masking layer.

Zacharatos F, Gianneta V, Nassiopoulou AG.

Nanotechnology. 2008 Dec 10;19(49):495306. doi: 10.1088/0957-4484/19/49/495306. Epub 2008 Nov 18.

PMID:
21730670
17.

Extended arrays of vertically aligned sub-10 nm diameter [100] Si nanowires by metal-assisted chemical etching.

Huang Z, Zhang X, Reiche M, Liu L, Lee W, Shimizu T, Senz S, Gösele U.

Nano Lett. 2008 Sep;8(9):3046-51. doi: 10.1021/nl802324y. Epub 2008 Aug 13.

PMID:
18698834
18.

Fabrication of silicon nanowire arrays by near-field laser ablation and metal-assisted chemical etching.

Brodoceanu D, Alhmoud HZ, Elnathan R, Delalat B, Voelcker NH, Kraus T.

Nanotechnology. 2016 Feb 19;27(7):075301. doi: 10.1088/0957-4484/27/7/075301. Epub 2016 Jan 18.

PMID:
26778665
19.
20.

Metal patterning on silicon surface by site-selective electroless deposition through colloidal crystal templating.

Asoh H, Sakamoto S, Ono S.

J Colloid Interface Sci. 2007 Dec 15;316(2):547-52. Epub 2007 Oct 30.

PMID:
17915242

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