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Items: 1 to 20 of 110

1.

Fabrication of sub-20 nm width ferromagnetic nanocontact structures by shadow evaporation.

Yao Z, Yang H, Li W, Li J, Cui A, Gu C.

J Nanosci Nanotechnol. 2013 Feb;13(2):1199-202.

PMID:
23646602
2.

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.

Grigorescu AE, Hagen CW.

Nanotechnology. 2009 Jul 22;20(29):292001. doi: 10.1088/0957-4484/20/29/292001. Epub 2009 Jul 1. Review.

PMID:
19567961
3.

Direct and reliable patterning of plasmonic nanostructures with sub-10-nm gaps.

Duan H, Hu H, Kumar K, Shen Z, Yang JK.

ACS Nano. 2011 Sep 27;5(9):7593-600. doi: 10.1021/nn2025868. Epub 2011 Aug 22.

PMID:
21846105
4.

Helium ion beam milling to create a nano-structured domain wall magnetoresistance spin valve.

Wang Y, Boden SA, Bagnall DM, Rutt HN, de Groot CH.

Nanotechnology. 2012 Oct 5;23(39):395302. doi: 10.1088/0957-4484/23/39/395302. Epub 2012 Sep 12.

PMID:
22972003
5.

The fabrication of ferromagnetic nanocontact structure.

Zhang Y, Wang K, Yang H, Xia X, Yao Z, Gu C.

J Nanosci Nanotechnol. 2010 Nov;10(11):7138-41.

PMID:
21137882
6.

Reliable fabrication of 3 nm gaps between nanoelectrodes by electron-beam lithography.

Manheller M, Trellenkamp S, Waser R, Karthäuser S.

Nanotechnology. 2012 Mar 30;23(12):125302. doi: 10.1088/0957-4484/23/12/125302.

PMID:
22414820
7.

Fabrication of novel two-dimensional nanopatterned conductive PEDOT:PSS films for organic optoelectronic applications.

Petti L, Rippa M, Capasso R, Nenna G, De Girolamo Del Mauro A, Pandolfi G, Maglione MG, Minarini C.

ACS Appl Mater Interfaces. 2013 Jun 12;5(11):4777-82. doi: 10.1021/am401451r. Epub 2013 May 15.

PMID:
23639365
8.

Combined AFM nano-machining and reactive ion etching to fabricate high aspect ratio structures.

Peng P, Shi T, Liao G, Tang Z.

J Nanosci Nanotechnol. 2010 Nov;10(11):7287-90.

PMID:
21137916
9.

Effect of post exposure bake in inorganic electron beam resist and utilizing for nanoimprint mold.

Shizuno M, Taniguchi J, Ogino K, Ishikawa K.

J Nanosci Nanotechnol. 2009 Jan;9(1):562-6.

PMID:
19441350
10.

Toward sub-20 nm hybrid nanofabrication by combining the molecular ruler method and electron beam lithography.

Li CB, Hasegawa T, Tanaka H, Miyazaki H, Odaka S, Tsukagoshi K, Aono M.

Nanotechnology. 2010 Dec 10;21(49):495304. doi: 10.1088/0957-4484/21/49/495304. Epub 2010 Nov 16.

PMID:
21079291
11.

Numerical feasibility study of the fabrication of subwavelength structure by mask lithography.

Ichikawa H, Kikuta H.

J Opt Soc Am A Opt Image Sci Vis. 2001 May;18(5):1093-100.

PMID:
11336212
12.

Controlled fabrication of artificial ferromagnetic (Fe,Mn)3O4 nanowall-wires by a three-dimensional nanotemplate pulsed laser deposition method.

Kushizaki T, Fujiwara K, Hattori AN, Kanki T, Tanaka H.

Nanotechnology. 2012 Dec 7;23(48):485308. doi: 10.1088/0957-4484/23/48/485308. Epub 2012 Nov 9.

PMID:
23138395
13.

Vacuum-free self-powered parallel electron lithography with sub-35-nm resolution.

Lu Y, Lal A.

Nano Lett. 2010 Jun 9;10(6):2197-201. doi: 10.1021/nl101055h.

PMID:
20481509
14.

Fabrication of large number density platinum nanowire arrays by size reduction lithography and nanoimprint lithography.

Yan XM, Kwon S, Contreras AM, Bokor J, Somorjai GA.

Nano Lett. 2005 Apr;5(4):745-8.

PMID:
15826120
15.

Sub-50 nm template fabrications for nanoimprint lithography using hydrogen silsesquioxane and silicon nitride.

Shim JY, Baek KH, Park KS, Shin HS, No KS, Lee K, Do LM.

J Nanosci Nanotechnol. 2010 May;10(5):3628-30.

PMID:
20359014
16.

Junction fabrication by shadow evaporation without a suspended bridge.

Lecocq F, Pop IM, Peng Z, Matei I, Crozes T, Fournier T, Naud C, Guichard W, Buisson O.

Nanotechnology. 2011 Aug 5;22(31):315302. doi: 10.1088/0957-4484/22/31/315302. Epub 2011 Jul 8.

PMID:
21737875
17.

Shot noise in electron-beam lithography and line-width measurements.

Kruit P, Steenbrink SW.

Scanning. 2006 Jan-Feb;28(1):20-6.

PMID:
16502622
18.

Quantized patterning using nanoimprinted blanks.

Chou SY, Li WD, Liang X.

Nanotechnology. 2009 Apr 15;20(15):155303. doi: 10.1088/0957-4484/20/15/155303. Epub 2009 Mar 24.

PMID:
19420545
19.

Determining the resolution limits of electron-beam lithography: direct measurement of the point-spread function.

Manfrinato VR, Wen J, Zhang L, Yang Y, Hobbs RG, Baker B, Su D, Zakharov D, Zaluzec NJ, Miller DJ, Stach EA, Berggren KK.

Nano Lett. 2014 Aug 13;14(8):4406-12. doi: 10.1021/nl5013773. Epub 2014 Jun 30.

PMID:
24960635
20.

Arrays of ultrasmall metal rings.

Singh DK, Krotkov RV, Xiang H, Xu T, Russell TP, Tuominen MT.

Nanotechnology. 2008 Jun 18;19(24):245305. doi: 10.1088/0957-4484/19/24/245305. Epub 2008 May 9.

PMID:
21825810

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