Format
Sort by

Send to

Choose Destination

Links from PubMed

Items: 1 to 20 of 121

1.

Investigations on the catastrophic damage in multilayer dielectric films.

Liu X, Zhao Y, Gao Y, Li D, Hu G, Zhu M, Fan Z, Shao J.

Appl Opt. 2013 Apr 1;52(10):2194-9. doi: 10.1364/AO.52.002194.

PMID:
23545976
2.

Characteristics of plasma scalds in multilayer dielectric films.

Liu X, Zhao Y, Li D, Hu G, Gao Y, Fan Z, Shao J.

Appl Opt. 2011 Jul 20;50(21):4226-31. doi: 10.1364/AO.50.004226.

PMID:
21772411
3.

Influence of nodular defects on the laser damage resistance of optical coatings in the femtosecond regime.

Gallais L, Cheng X, Wang Z.

Opt Lett. 2014 Mar 15;39(6):1545-8. doi: 10.1364/OL.39.001545.

PMID:
24690834
4.

Comparative study of Laser induce damage of HfO2/SiO2 and TiO2/SiO2 mirrors at 1064 nm.

Jiao H, Ding T, Zhang Q.

Opt Express. 2011 Feb 28;19(5):4059-66. doi: 10.1364/OE.19.004059.

PMID:
21369234
5.

Fabrication of mitigation pits for improving laser damage resistance in dielectric mirrors by femtosecond laser machining.

Wolfe JE, Qiu SR, Stolz CJ.

Appl Opt. 2011 Mar 20;50(9):C457-62. doi: 10.1364/AO.50.00C457.

PMID:
21460980
6.

Impact of laser-contaminant interaction on the performance of the protective capping layer of 1 ω high-reflection mirror coatings.

Qiu SR, Norton MA, Raman RN, Rubenchik AM, Boley CD, Rigatti A, Mirkarimi PB, Stolz CJ, Matthews MJ.

Appl Opt. 2015 Oct 10;54(29):8607-16. doi: 10.1364/AO.54.008607.

PMID:
26479794
7.

Laser-resistance sensitivity to substrate pit size of multilayer coatings.

Chai Y, Zhu M, Wang H, Xing H, Cui Y, Sun J, Yi K, Shao J.

Sci Rep. 2016 Jun 1;6:27076. doi: 10.1038/srep27076.

8.

Coupling effect of multi-wavelength lasers in damage performance of beam splitters at 355 nm and 1064 nm.

Yan L, Wei C, Li D, Hu G, Yi K, Fan Z.

Appl Opt. 2012 Jun 1;51(16):3243-9. doi: 10.1364/AO.51.003243.

PMID:
22695556
9.

Multilayer deformation planarization by substrate pit suturing.

Chai Y, Zhu M, Xing H, Wang H, Cui Y, Shao J.

Opt Lett. 2016 Aug 1;41(15):3403-6. doi: 10.1364/OL.41.003403.

PMID:
27472579
10.

Investigations on single and multiple pulse laser-induced damages in HfO₂/SiO₂ multilayer dielectric films at 1,064 nm.

Liu W, Wei C, Wu J, Yu Z, Cui H, Yi K, Shao J.

Opt Express. 2013 Sep 23;21(19):22476-87. doi: 10.1364/OE.21.022476.

PMID:
24104137
11.

Femtosecond laser-induced damage of HfO2/SiO2 mirror with different stack structure.

Chen S, Zhao Y, Yu Z, Fang Z, Li D, He H, Shao J.

Appl Opt. 2012 Sep 1;51(25):6188-95. doi: 10.1364/AO.51.006188.

PMID:
22945167
12.

Suppression of nano-absorbing precursors and damage mechanism in optical coatings for 3ω mirrors.

Wang H, Qi H, Zhang W, Sun J, Chai Y, Tu F, Zhao J, Yu Z, Wang B, Zhu M, Yi K, Shao J.

Opt Lett. 2016 Mar 15;41(6):1209-12. doi: 10.1364/OL.41.001209.

PMID:
26977671
13.

Nanosecond pulsed laser damage characteristics of HfO2/SiO2 high reflection coatings irradiated from crystal-film interface.

Cheng X, Jiao H, Lu J, Ma B, Wang Z.

Opt Express. 2013 Jun 17;21(12):14867-75. doi: 10.1364/OE.21.014867.

PMID:
23787674
14.

Effect of nanosecond laser pre-irradiation on the femtosecond laser-induced damage of Ta2O5/SiO2 high reflector.

Chen S, Zhao Y, Li D, He H, Shao J.

Appl Opt. 2012 Apr 1;51(10):1495-502. doi: 10.1364/AO.51.001495.

PMID:
22505067
15.

Damage threshold prediction of hafnia-silica multilayer coatings by nondestructive evaluation of fluence-limiting defects.

Wu Z, Stolz CJ, Weakley SC, Hughes JD, Zhao Q.

Appl Opt. 2001 Apr 20;40(12):1897-906.

PMID:
18357189
16.

Searching for optimal mitigation geometries for laser-resistant multilayer high-reflector coatings.

Qiu SR, Wolfe JE, Monterrosa AM, Feit MD, Pistor TV, Stolz CJ.

Appl Opt. 2011 Mar 20;50(9):C373-81. doi: 10.1364/AO.50.00C373.

PMID:
21460967
17.
18.

Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors.

Cheng X, Shen Z, Jiao H, Zhang J, Ma B, Ding T, Lu J, Wang X, Wang Z.

Appl Opt. 2011 Mar 20;50(9):C357-63. doi: 10.1364/AO.50.00C357.

PMID:
21460963
19.

Refractive index of thin films of SiO2, ZrO2, and HfO2 as a function of the films' mass density.

Jerman M, Qiao Z, Mergel D.

Appl Opt. 2005 May 20;44(15):3006-12.

PMID:
15929291
20.

Dual wavelength laser-induced damage threshold measurements of alumina/silica and hafnia/silica ultraviolet antireflective coatings.

Mrohs M, Jensen L, Günster S, Alig T, Ristau D.

Appl Opt. 2016 Jan 1;55(1):104-9. doi: 10.1364/AO.55.000104.

PMID:
26835628
Items per page

Supplemental Content

Support Center