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Items: 1 to 20 of 152

1.

Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry.

Borah D, Rasappa S, Senthamaraikannan R, Kosmala B, Shaw MT, Holmes JD, Morris MA.

ACS Appl Mater Interfaces. 2013 Jan;5(1):88-97. doi: 10.1021/am302150z.

PMID:
23227917
2.

Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly.

Borah D, Rasappa S, Senthamaraikannan R, Holmes JD, Morris MA.

Langmuir. 2013 Jul 16;29(28):8959-68. doi: 10.1021/la401561k.

PMID:
23751134
3.

Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process.

Borah D, Shaw MT, Holmes JD, Morris MA.

ACS Appl Mater Interfaces. 2013 Mar;5(6):2004-12. doi: 10.1021/am302830w.

PMID:
23421383
4.

Nanoscale silicon substrate patterns from self-assembly of cylinder forming poly(styrene)-block-poly(dimethylsiloxane) block copolymer on silane functionalized surfaces.

Borah D, Cummins C, Rasappa S, Watson SM, Pike AR, Horrocks BR, Fulton DA, Houlton A, Liontos G, Ntetsikas K, Avgeropoulos A, Morris MA.

Nanotechnology. 2017 Jan 27;28(4):044001. doi: 10.1088/1361-6528/28/4/044001.

PMID:
27981945
5.

Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems.

Borah D, Ozmen M, Rasappa S, Shaw MT, Holmes JD, Morris MA.

Langmuir. 2013 Mar 5;29(9):2809-20. doi: 10.1021/la304140q.

PMID:
23363319
6.

Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted technique.

Borah D, Senthamaraikannan R, Rasappa S, Kosmala B, Holmes JD, Morris MA.

ACS Nano. 2013 Aug 27;7(8):6583-96. doi: 10.1021/nn4035519.

PMID:
23859379
7.

Selective sidewall wetting of polymer blocks in hydrogen silsesquioxane directed self-assembly of PS-b-PDMS.

Hobbs RG, Farrell RA, Bolger CT, Kelly RA, Morris MA, Petkov N, Holmes JD.

ACS Appl Mater Interfaces. 2012 Sep 26;4(9):4637-42.

PMID:
22856644
8.

Sub-10 nm Silicon Nanopillar Fabrication Using Fast and Brushless Thermal Assembly of PS-b-PDMS Diblock Copolymer.

Garnier J, Arias-Zapata J, Marconot O, Arnaud S, Böhme S, Girardot C, Buttard D, Zelsmann M.

ACS Appl Mater Interfaces. 2016 Apr 20;8(15):9954-60. doi: 10.1021/acsami.6b01255.

PMID:
27020847
9.

The fabrication of highly ordered block copolymer micellar arrays: control of the separation distances of silicon oxide dots.

Yoo H, Park S.

Nanotechnology. 2010 Jun 18;21(24):245304. doi: 10.1088/0957-4484/21/24/245304.

PMID:
20498523
10.

The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions.

Borah D, Rasappa S, Senthamaraikannan R, Shaw MT, Holmes JD, Morris MA.

J Colloid Interface Sci. 2013 Mar 1;393:192-202. doi: 10.1016/j.jcis.2012.10.070.

PMID:
23218235
11.

Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.

Park SM, Liang X, Harteneck BD, Pick TE, Hiroshiba N, Wu Y, Helms BA, Olynick DL.

ACS Nano. 2011 Nov 22;5(11):8523-31. doi: 10.1021/nn201391d.

PMID:
21995511
12.

Preparation and characterization of V-shaped PS-b-PEO brushes anchored on planar gold substrate through the trithiocarbonate junction group.

Wang ZL, Xu JT, Du BY, Fan ZQ.

J Colloid Interface Sci. 2012 Oct 15;384(1):29-37. doi: 10.1016/j.jcis.2012.06.067.

PMID:
22832097
13.

Conversion of bilayers of PS-b-PDMS block copolymer into closely packed, aligned silica nanopatterns.

Wu NL, Harris KD, Buriak JM.

ACS Nano. 2013 Jun 25;7(6):5595-606. doi: 10.1021/nn401968t.

PMID:
23675942
14.

Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer.

Huang W, Luo C, Zhang J, Han Y.

J Chem Phys. 2007 Mar 14;126(10):104901.

PMID:
17362081
15.

Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.

Girardot C, Böhme S, Archambault S, Salaün M, Latu-Romain E, Cunge G, Joubert O, Zelsmann M.

ACS Appl Mater Interfaces. 2014 Sep 24;6(18):16276-82. doi: 10.1021/am504475q.

PMID:
25111901
16.

Surface engineering using Kumada catalyst-transfer polycondensation (KCTP): preparation and structuring of poly(3-hexylthiophene)-based graft copolymer brushes.

Khanduyeva N, Senkovskyy V, Beryozkina T, Horecha M, Stamm M, Uhrich C, Riede M, Leo K, Kiriy A.

J Am Chem Soc. 2009 Jan 14;131(1):153-61. doi: 10.1021/ja8050734.

PMID:
19128176
17.
19.

Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns.

Liu Z, Gu X, Hwu J, Sassolini S, Olynick DL.

Nanotechnology. 2014 Jul 18;25(28):285301. doi: 10.1088/0957-4484/25/28/285301.

PMID:
24971641
20.

Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography.

Rasappa S, Borah D, Faulkner CC, Lutz T, Shaw MT, Holmes JD, Morris MA.

Nanotechnology. 2013 Feb 15;24(6):065503. doi: 10.1088/0957-4484/24/6/065503.

PMID:
23340158
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