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Items: 1 to 20 of 89

1.

Site-selective electroless metallization on porous organosilica films by multisurface modification of alkyl monolayer and vacuum plasma.

Chen GS, Chen ST, Chen YW, Hsu YC.

Langmuir. 2013 Jan 15;29(2):511-8. doi: 10.1021/la303473r. Epub 2012 Dec 28.

PMID:
23205708
2.

Nanoseeding via dual surface modification of alkyl monolayer for site-controlled electroless metallization.

Chen ST, Chen GS.

Langmuir. 2011 Oct 4;27(19):12143-8. doi: 10.1021/la202104z. Epub 2011 Aug 31.

PMID:
21842871
3.

Patterning functional materials using channel diffused plasma-etched self-assembled monolayer templates.

George A, Maijenburg AW, Maas MG, Blank DH, ten Elshof JE.

Langmuir. 2011 Oct 4;27(19):12235-42. doi: 10.1021/la2013667. Epub 2011 Sep 1.

PMID:
21859121
4.

Selective electroless copper deposition on self-assembled dithiol monolayers.

Aldakov D, Bonnassieux Y, Geffroy B, Palacin S.

ACS Appl Mater Interfaces. 2009 Mar;1(3):584-9. doi: 10.1021/am8001346.

PMID:
20355979
5.

Effects of surface properties of different substrates on fine structure of plasma-polymerized SiOCH films prepared from hexamethyldisiloxane (HMDSO).

Lo CH, Liao KS, De Guzman M, Rouessac V, Wei TC, Lee KR, Lai JY.

Langmuir. 2010 Nov 16;26(22):17470-6. doi: 10.1021/la102759b. Epub 2010 Oct 8.

PMID:
20932039
6.

Chemical modifications of inert organic monolayers with oxygen plasma for biosensor applications.

Xue CY, Yang KL.

Langmuir. 2007 May 8;23(10):5831-5. Epub 2007 Apr 11.

PMID:
17425347
7.

UV-ozone modification of plasma-polymerised acetonitrile films for enhanced cell attachment.

Davidson MR, Mitchell SA, Bradley RH.

Colloids Surf B Biointerfaces. 2004 Apr 15;34(4):213-9.

PMID:
15261060
8.

Local modification of self-assembled monolayers by a photocatalytic probe.

Tzeng SD, Chiang CH, Chien FS.

J Nanosci Nanotechnol. 2010 Jul;10(7):4495-9.

PMID:
21128446
9.

Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon.

Ben Slama S, Hajji M, Ezzaouia H.

Nanoscale Res Lett. 2012 Aug 17;7(1):464. doi: 10.1186/1556-276X-7-464.

10.

Selective electroless deposition of copper on organic thin films with improved morphology.

Lu P, Shi Z, Walker AV.

Langmuir. 2011 Nov 1;27(21):13022-8. doi: 10.1021/la202839z. Epub 2011 Oct 6.

PMID:
21936558
11.

Plasma surface modification of organic materials: comparison between polyethylene films and octadecyltrichlorosilane self-assembled monolayers.

Tatoulian M, Bouloussa O, Morière F, Arefi-Khonsari F, Amouroux J, Rondelez F.

Langmuir. 2004 Nov 23;20(24):10481-9.

PMID:
15544376
12.

Multilength-scale chemical patterning of self-assembled monolayers by spatially controlled plasma exposure: nanometer to centimeter range.

Lin MH, Chen CF, Shiu HW, Chen CH, Gwo S.

J Am Chem Soc. 2009 Aug 12;131(31):10984-91. doi: 10.1021/ja901619h.

PMID:
19722673
13.

Metallization of a thiol-terminated organic surface using chemical vapor deposition.

Rajalingam K, Strunskus T, Terfort A, Fischer RA, Wöll C.

Langmuir. 2008 Aug 5;24(15):7986-94. doi: 10.1021/la8008927. Epub 2008 Jul 1.

PMID:
18590295
14.

Experimental and theoretical studies of the interaction of gas phase nitric acid and water with a self-assembled monolayer.

Moussa SG, Stern AC, Raff JD, Dilbeck CW, Tobias DJ, Finlayson-Pitts BJ.

Phys Chem Chem Phys. 2013 Jan 14;15(2):448-58. doi: 10.1039/c2cp42405c. Epub 2012 Nov 16.

PMID:
23160633
15.

Multidentate adsorbates for self-assembled monolayer films.

Chinwangso P, Jamison AC, Lee TR.

Acc Chem Res. 2011 Jul 19;44(7):511-9. doi: 10.1021/ar200020s. Epub 2011 May 25.

PMID:
21612198
16.

Copper-metal deposition on self assembled monolayer for making top contacts in molecular electronic devices.

Seitz O, Dai M, Aguirre-Tostado FS, Wallace RM, Chabal YJ.

J Am Chem Soc. 2009 Dec 23;131(50):18159-67. doi: 10.1021/ja907003w.

PMID:
19924992
17.

Strain-effect for controlled growth mode and well-ordered structure of quaterrylene thin films.

Hayakawa R, Turak A, Zhang X, Hiroshiba N, Dosch H, Chikyow T, Wakayama Y.

J Chem Phys. 2010 Jul 21;133(3):034706. doi: 10.1063/1.3456733.

PMID:
20649349
18.

Self-formed mn oxide barrier on SiOCH for nanoscale copper interconnect by metal organic chemical vapor deposition of Mn.

Moon HK, Kim BY, Mi J, Lee HL, Lee NE.

J Nanosci Nanotechnol. 2013 Dec;13(12):8041-9.

PMID:
24266188
19.

Investigation of the mechanism of nickel electroless deposition on functionalized self-assembled monolayers.

Shi Z, Walker AV.

Langmuir. 2011 Jun 7;27(11):6932-9. doi: 10.1021/la2012843. Epub 2011 May 9.

PMID:
21553831
20.

Characterization of monolayer formation on aluminum-doped zinc oxide thin films.

Rhodes CL, Lappi S, Fischer D, Sambasivan S, Genzer J, Franzen S.

Langmuir. 2008 Jan 15;24(2):433-40. Epub 2007 Dec 11.

PMID:
18069859

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