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Items: 1 to 20 of 115

1.

Lattice deformation and domain distortion in the self-assembly of block copolymer thin films on chemical patterns.

Xu J, Russell TP, Checco A.

Small. 2013 Mar 11;9(5):779-84. doi: 10.1002/smll.201201950. Epub 2012 Nov 23.

PMID:
23180675
2.

Thickness and Microdomain Orientation of Asymmetric PS-b-PMMA Block Copolymer Films Inside Periodic Gratings.

Ferrarese Lupi F, Aprile G, Giammaria TJ, Seguini G, Zuccheri G, De Leo N, Boarino L, Laus M, Perego M.

ACS Appl Mater Interfaces. 2015 Oct 28;7(42):23615-22. doi: 10.1021/acsami.5b07127. Epub 2015 Oct 16.

PMID:
26439144
3.

Three-dimensional multilayered nanostructures with controlled orientation of microdomains from cross-linkable block copolymers.

Jung H, Hwang D, Kim E, Kim BJ, Lee WB, Poelma JE, Kim J, Hawker CJ, Huh J, Ryu du Y, Bang J.

ACS Nano. 2011 Aug 23;5(8):6164-73. doi: 10.1021/nn2006943. Epub 2011 Jul 20.

PMID:
21749153
4.

Aligned nanowires and nanodots by directed block copolymer assembly.

Xiao S, Yang X, Lee KY, ver der Veerdonk RJ, Kuo D, Russell TP.

Nanotechnology. 2011 Jul 29;22(30):305302. doi: 10.1088/0957-4484/22/30/305302. Epub 2011 Jun 23.

PMID:
21697581
5.

Nanostructure engineering by templated self-assembly of block copolymers.

Cheng JY, Mayes AM, Ross CA.

Nat Mater. 2004 Nov;3(11):823-8. Epub 2004 Oct 3.

PMID:
15467725
6.

Characterizing Patterned Block Copolymer Thin Films with Soft X-rays.

Sunday DF, Ren J, Liman CD, Williamson LD, Gronheid R, Nealey PF, Kline RJ.

ACS Appl Mater Interfaces. 2017 Sep 20;9(37):31325-31334. doi: 10.1021/acsami.7b02791. Epub 2017 Jun 6.

PMID:
28541658
7.

Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns.

Choi J, Li Y, Kim PY, Liu F, Kim H, Yu DM, Huh J, Carter KR, Russell TP.

ACS Appl Mater Interfaces. 2018 Mar 7;10(9):8324-8332. doi: 10.1021/acsami.7b17713. Epub 2018 Feb 27.

PMID:
29443490
8.

Collective behavior of block copolymer thin films within periodic topographical structures.

Perego M, Andreozzi A, Vellei A, Ferrarese Lupi F, Seguini G.

Nanotechnology. 2013 Jun 21;24(24):245301. doi: 10.1088/0957-4484/24/24/245301. Epub 2013 May 16.

PMID:
23680847
9.

Circular nanopatterns over large areas from the self-assembly of block copolymers guided by shallow trenches.

Hong SW, Gu X, Huh J, Xiao S, Russell TP.

ACS Nano. 2011 Apr 26;5(4):2855-60. doi: 10.1021/nn103401w. Epub 2011 Mar 11.

PMID:
21395225
10.

Novel nanostructures from self-assembly of chiral block copolymers.

Ho RM, Chen CK, Chiang YW.

Macromol Rapid Commun. 2009 Sep 1;30(17):1439-56. doi: 10.1002/marc.200900181. Epub 2009 Jun 16.

PMID:
21638404
11.

Phase-field modeling of the formation of lamellar nanostructures in diblock copolymer thin films under inplanar electric fields.

Wu XF, Dzenis YA.

Phys Rev E Stat Nonlin Soft Matter Phys. 2008 Mar;77(3 Pt 1):031807. Epub 2008 Mar 26.

12.

Macroscopically ordered hexagonal arrays by directed self-assembly of block copolymers with minimal topographic patterns.

Choi J, Gunkel I, Li Y, Sun Z, Liu F, Kim H, Carter KR, Russell TP.

Nanoscale. 2017 Oct 12;9(39):14888-14896. doi: 10.1039/c7nr05394k.

PMID:
28949359
13.

Orienting block copolymer microdomains with block copolymer brushes.

Gu W, Hong SW, Russell TP.

ACS Nano. 2012 Nov 27;6(11):10250-7. doi: 10.1021/nn304049w. Epub 2012 Oct 29.

PMID:
23092357
14.

Directed self-assembly of cylinder-forming diblock copolymers on sparse chemical patterns.

Yang YB, Choi YJ, Kim SO, Kim JU.

Soft Matter. 2015 Jun 14;11(22):4496-506. doi: 10.1039/c5sm00474h.

PMID:
25947222
15.

Interfacial Energy-Controlled Top Coats for Gyroid/Cylinder Phase Transitions of Polystyrene-block-polydimethylsiloxane Block Copolymer Thin Films.

Ryu IH, Kim YJ, Jung YS, Lim JS, Ross CA, Son JG.

ACS Appl Mater Interfaces. 2017 May 24;9(20):17427-17434. doi: 10.1021/acsami.7b02910. Epub 2017 May 10.

PMID:
28470057
16.

Preparation of metallic line patterns from functional block copolymers.

Park S, Kim B, Cirpan A, Russell TP.

Small. 2009 Jun;5(11):1343-8. doi: 10.1002/smll.200801409.

PMID:
19291735
17.

Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns.

Choi J, Huh J, Carter KR, Russell TP.

ACS Nano. 2016 Aug 23;10(8):7915-25. doi: 10.1021/acsnano.6b03857. Epub 2016 Jul 18.

PMID:
27391372
18.

An emerging pore-making strategy: confined swelling-induced pore generation in block copolymer materials.

Wang Y, Li F.

Adv Mater. 2011 May 17;23(19):2134-48. doi: 10.1002/adma.201004022. Epub 2011 Apr 5. Review.

PMID:
21469216
19.

Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.

Park SM, Liang X, Harteneck BD, Pick TE, Hiroshiba N, Wu Y, Helms BA, Olynick DL.

ACS Nano. 2011 Nov 22;5(11):8523-31. doi: 10.1021/nn201391d. Epub 2011 Oct 26.

PMID:
21995511
20.

Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates.

Wan L, Ji S, Liu CC, Craig GS, Nealey PF.

Soft Matter. 2016 Mar 21;12(11):2914-22. doi: 10.1039/c5sm02829a.

PMID:
26891026

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