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Items: 1 to 20 of 150

1.

Structural, chemical, optical, and electrical evolution of SnO(x) films deposited by reactive rf magnetron sputtering.

Luo H, Liang LY, Cao HT, Liu ZM, Zhuge F.

ACS Appl Mater Interfaces. 2012 Oct 24;4(10):5673-7. doi: 10.1021/am301601s. Epub 2012 Oct 11.

PMID:
23025234
2.

Microstructural, optical, and electrical properties of SnO thin films prepared on quartz via a two-step method.

Liang LY, Liu ZM, Cao HT, Pan XQ.

ACS Appl Mater Interfaces. 2010 Apr;2(4):1060-5. doi: 10.1021/am900838z.

PMID:
20423126
3.

Enhanced p-type conductivity and band gap narrowing in heavily Al doped NiO thin films deposited by RF magnetron sputtering.

Nandy S, Maiti UN, Ghosh CK, Chattopadhyay KK.

J Phys Condens Matter. 2009 Mar 18;21(11):115804. doi: 10.1088/0953-8984/21/11/115804. Epub 2009 Feb 24.

PMID:
21693930
4.

Influence of deposition pressure on N-doped ZnO films by RF magnetron sputtering.

Wang J, Elamurugu E, Franco N, Alves E, Botelho do Rego AM, Gonçalves G, Martins R, Fortunato E.

J Nanosci Nanotechnol. 2010 Apr;10(4):2674-8.

PMID:
20355483
5.
6.

Thermal stability of high-k Si-rich HfO(2) layers grown by RF magnetron sputtering.

Khomenkova L, Portier X, Cardin J, Gourbilleau F.

Nanotechnology. 2010 Jul 16;21(28):285707. doi: 10.1088/0957-4484/21/28/285707. Epub 2010 Jun 28.

PMID:
20585152
7.

Sputtering deposition of P-type SnO films with SnO₂ target in hydrogen-containing atmosphere.

Hsu PC, Hsu CJ, Chang CH, Tsai SP, Chen WC, Hsieh HH, Wu CC.

ACS Appl Mater Interfaces. 2014 Aug 27;6(16):13724-9. doi: 10.1021/am5031787. Epub 2014 Jul 18.

PMID:
25036847
8.

Phase transformation and disorder effect on optical and electrical properties of Zn3P2 thin films.

El Zawawi IK, Abdel Moez A, Hammad TR, Ibrahim RS.

Spectrochim Acta A Mol Biomol Spectrosc. 2012 Aug;94:378-83. doi: 10.1016/j.saa.2012.03.072. Epub 2012 Apr 10.

PMID:
22595250
9.

Intrinsic p type ZnO films deposited by rf magnetron sputtering.

Wang J, Martins R, Barradas NP, Alves E, Monteiro T, Peres M, Elamurugu E, Fortunato E.

J Nanosci Nanotechnol. 2009 Feb;9(2):813-6.

PMID:
19441398
10.

Defect-driven magnetism in luminescent n/p-type pristine and Gd-substituted SnO2 nanocrystalline thin films.

Ghosh S, Khan GG, Mandal K.

ACS Appl Mater Interfaces. 2012 Apr;4(4):2048-56. doi: 10.1021/am300023a. Epub 2012 Mar 27.

PMID:
22423973
11.

ZnO thin films implanted with Al, Sb and P: optical, structural and electrical characterization.

Viseu T, Ayres de Campos J, Rolo AG, de Lacerda-Arôso T, Cerqueira MF, Alves E.

J Nanosci Nanotechnol. 2009 Jun;9(6):3574-7.

PMID:
19504884
12.

Effect of annealing on the formation of p-type conductivity in nano-Zn0.92Mn0.08O:N films.

Ruan H, Fang L, Qin G, Kong C.

J Nanosci Nanotechnol. 2011 Dec;11(12):11049-54.

PMID:
22409054
13.

Electrical and optical properties of Y-doped indium zinc oxide films grown by RF magnetron sputtering.

Lee YJ, Kim JH, Oh BY, Kim KY.

J Nanosci Nanotechnol. 2013 Sep;13(9):6296-9.

PMID:
24205648
14.

Electrical and Raman scattering studies of ZnO:P and ZnO:Sb thin films.

de Campos JA, Viseu T, Rolo AG, Barradas NP, Alves E, de Lacerda-Arôso T, Cerqueira MF.

J Nanosci Nanotechnol. 2010 Apr;10(4):2620-3.

PMID:
20355473
15.

[Study of transmittance of ZnO film deposited on different substrate].

Yuan GC, Xu Z, Zhang FJ, Wang Y, Zhao DW, Xu HH.

Guang Pu Xue Yu Guang Pu Fen Xi. 2007 Jul;27(7):1263-6. Chinese.

PMID:
17944390
16.

Synthesis and properties of nanocrystalline copper indium oxide thin films deposited by Rf magnetron sputtering.

Singh M, Singh VN, Mehta BR.

J Nanosci Nanotechnol. 2008 Aug;8(8):3889-94.

PMID:
19049146
17.

CO gas sensing by ultrathin tin oxide films grown by atomic layer deposition using transmission FTIR spectroscopy.

Du X, Du Y, George SM.

J Phys Chem A. 2008 Oct 2;112(39):9211-9. doi: 10.1021/jp800518v. Epub 2008 Aug 16.

PMID:
18710189
18.

Evolution of orientation degree, lattice dynamics and electronic band structure properties in nanocrystalline lanthanum-doped bismuth titanate ferroelectric films by chemical solution deposition.

Zhang J, Chen X, Jiang K, Shen Y, Li Y, Hu Z, Chu J.

Dalton Trans. 2011 Aug 21;40(31):7967-75. doi: 10.1039/c1dt10443h. Epub 2011 Jul 8.

PMID:
21743909
19.

Effect of postdeposition annealing on the structure, composition, and the mechanical and optical characteristics of niobium and tantalum oxide films.

Cetinörgü-Goldenberg E, Klemberg-Sapieha JE, Martinu L.

Appl Opt. 2012 Sep 20;51(27):6498-507. doi: 10.1364/AO.51.006498.

PMID:
23033019
20.

P-type Cuox thin films by rf-plasma enhanced reactive thermal evaporation: influence of rf-power density.

Lavareda G, de Carvalho CN, Ferraria AM, do Rego AM, Amaral A.

J Nanosci Nanotechnol. 2012 Aug;12(8):6754-7.

PMID:
22962818

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