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Items: 1 to 20 of 83

1.

The dual role of silver during silicon etching in HF solution.

Abouda-Lachiheb M, Nafie N, Bouaicha M.

Nanoscale Res Lett. 2012 Aug 13;7(1):455. doi: 10.1186/1556-276X-7-455.

2.

Surface-enhanced Raman scattering dendritic substrates fabricated by deposition of gold and silver on silicon.

Cheng M, Fang J, Cao M, Jin Y.

J Nanosci Nanotechnol. 2010 Nov;10(11):7451-4.

PMID:
21137957
3.

Template-free fabrication of silicon micropillar/nanowire composite structure by one-step etching.

Bai F, Li M, Huang R, Song D, Jiang B, Li Y.

Nanoscale Res Lett. 2012 Oct 8;7(1):557. doi: 10.1186/1556-276X-7-557.

4.

Nanopore-type black silicon anti-reflection layers fabricated by a one-step silver-assisted chemical etching.

Lu YT, Barron AR.

Phys Chem Chem Phys. 2013 Jun 28;15(24):9862-70. doi: 10.1039/c3cp51835c. Epub 2013 May 16.

PMID:
23677129
5.

Superhydrophobic silicon surfaces with micro-nano hierarchical structures via deep reactive ion etching and galvanic etching.

He Y, Jiang C, Yin H, Chen J, Yuan W.

J Colloid Interface Sci. 2011 Dec 1;364(1):219-29. doi: 10.1016/j.jcis.2011.07.030. Epub 2011 Aug 5.

PMID:
21889158
6.

Effect of electroless etching parameters on the growth and reflection properties of silicon nanowires.

Ozdemir B, Kulakci M, Turan R, Unalan HE.

Nanotechnology. 2011 Apr 15;22(15):155606. doi: 10.1088/0957-4484/22/15/155606. Epub 2011 Mar 10.

PMID:
21389572
7.

Tailoring broadband antireflection on a silicon surface through two-step silver-assisted chemical etching.

Chen CY, Li WJ, Chen HH.

Chemphyschem. 2012 Apr 23;13(6):1415-20. doi: 10.1002/cphc.201100981. Epub 2012 Mar 7.

PMID:
22407606
8.

Ordered arrays of vertically aligned [110] silicon nanowires by suppressing the crystallographically preferred <100> etching directions.

Huang Z, Shimizu T, Senz S, Zhang Z, Zhang X, Lee W, Geyer N, Gösele U.

Nano Lett. 2009 Jul;9(7):2519-25. doi: 10.1021/nl803558n.

PMID:
19480399
9.

Micro-PIXE and micro-RBS characterization of micropores in porous silicon prepared using microwave-assisted hydrofluoric acid etching.

Ahmad M, Grime GW.

Microsc Microanal. 2013 Apr;19(2):261-7. doi: 10.1017/S1431927612014262. Epub 2013 Feb 7.

PMID:
23388452
10.
11.

Formation and metrology of dual scale nano-morphology on SF(6) plasma etched silicon surfaces.

Boulousis G, Constantoudis V, Kokkoris G, Gogolides E.

Nanotechnology. 2008 Jun 25;19(25):255301. doi: 10.1088/0957-4484/19/25/255301. Epub 2008 May 14.

PMID:
21828648
12.

One-step fabrication of nanostructures by femtosecond laser for surface-enhanced Raman scattering.

Lin CH, Jiang L, Chai YH, Xiao H, Chen SJ, Tsai HL.

Opt Express. 2009 Nov 23;17(24):21581-9. doi: 10.1364/OE.17.021581.

PMID:
19997399
13.

Titrimetric determination of silicon dissolved in concentrated HF-HNO3-etching solutions.

Henssge A, Acker J, Müller C.

Talanta. 2006 Jan 15;68(3):581-5. doi: 10.1016/j.talanta.2005.04.049. Epub 2005 May 31.

PMID:
18970360
14.

Patterning of various silicon structures via polymer lithography and catalytic chemical etching.

Lee JP, Bang BM, Choi S, Kim T, Park S.

Nanotechnology. 2011 Jul 8;22(27):275305. doi: 10.1088/0957-4484/22/27/275305. Epub 2011 May 20.

PMID:
21597138
15.
16.

Formation mechanism and characterization of black silicon surface by a single-step wet-chemical process.

Li LG, Liu SM, Ye XL, Hossu M, Jiang K, Chen W, Wang ZG.

J Nanosci Nanotechnol. 2012 May;12(5):3954-8.

PMID:
22852331
17.

Electron beam induced deposition of silicon nanostructures from a liquid phase precursor.

Liu Y, Chen X, Noh KW, Dillon SJ.

Nanotechnology. 2012 Sep 28;23(38):385302. doi: 10.1088/0957-4484/23/38/385302. Epub 2012 Sep 4.

PMID:
22948193
18.

Wafer-scale synthesis of single-crystal zigzag silicon nanowire arrays with controlled turning angles.

Chen H, Wang H, Zhang XH, Lee CS, Lee ST.

Nano Lett. 2010 Mar 10;10(3):864-8. doi: 10.1021/nl903391x.

PMID:
20104856
19.

One-pot fabrication of various silver nanostructures on substrates using electron beam irradiation.

Kim SE, Han YH, Lee Bc, Lee JC.

Nanotechnology. 2010 Feb 19;21(7):75302. doi: 10.1088/0957-4484/21/7/075302. Epub 2010 Jan 18.

PMID:
20081291
20.

Preparation of a SERS substrate and its sample-loading method for point-of-use application.

Fang C, Agarwal A, Ji H, Karen WY, Yobas L.

Nanotechnology. 2009 Oct 7;20(40):405604. doi: 10.1088/0957-4484/20/40/405604. Epub 2009 Sep 8.

PMID:
19738294

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