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Items: 1 to 20 of 92

1.

Copper-selective electrochemical filling of macropore arrays for through-silicon via applications.

Defforge T, Billoué J, Diatta M, Tran-Van F, Gautier G.

Nanoscale Res Lett. 2012 Jul 9;7(1):375. doi: 10.1186/1556-276X-7-375.

2.

Area-selective formation of macropore array by anisotropic electrochemical etching on an n-Si(100) surface in aqueous HF solution.

Homma T, Sato H, Mori K, Osaka T, Shoji S.

J Phys Chem B. 2005 Mar 31;109(12):5724-7.

PMID:
16851620
3.
4.

Macropore formation in p-type silicon: toward the modeling of morphology.

Slimani A, Iratni A, Henry H, Plapp M, Chazalviel JN, Ozanam F, Gabouze N.

Nanoscale Res Lett. 2014 Oct 21;9(1):585. doi: 10.1186/1556-276X-9-585. eCollection 2014.

5.

Selective etching of n-type silicon in pn junction structure in hydrofluoric acid and its application in silicon nanowire fabrication.

Wang H, Jin Z, Zheng Y, Ma H, Li T, Wang Y.

Nanotechnology. 2008 Apr 30;19(17):175307. doi: 10.1088/0957-4484/19/17/175307. Epub 2008 Mar 25.

PMID:
21825671
6.

Plasma-deposited fluoropolymer film mask for local porous silicon formation.

Defforge T, Capelle M, Tran-Van F, Gautier G.

Nanoscale Res Lett. 2012 Jun 26;7(1):344. doi: 10.1186/1556-276X-7-344.

7.

Analysis of p-Si macropore etching using FFT-impedance spectroscopy.

Ossei-Wusu E, Carstensen J, Föll H.

Nanoscale Res Lett. 2012 Jun 20;7(1):320. doi: 10.1186/1556-276X-7-320.

8.

Highly ordered hexagonally arranged nanostructures on silicon through a self-assembled silicon-integrated porous anodic alumina masking layer.

Zacharatos F, Gianneta V, Nassiopoulou AG.

Nanotechnology. 2008 Dec 10;19(49):495306. doi: 10.1088/0957-4484/19/49/495306. Epub 2008 Nov 18.

PMID:
21730670
9.

Application of nanoporous silicon for a metal-semiconductor-metal visible light photodetector.

Atiwongsangthong N, Niemcharoen S, Titiroongruang W.

J Nanosci Nanotechnol. 2011 Jan;11(1):228-32.

PMID:
21446431
10.

Controllable doping and wrap-around contacts to electrolessly etched silicon nanowire arrays.

Sadhu JS, Tian H, Spila T, Kim J, Azeredo B, Ferreira P, Sinha S.

Nanotechnology. 2014 Sep 19;25(37):375701. doi: 10.1088/0957-4484/25/37/375701. Epub 2014 Aug 22.

PMID:
25148135
11.

Elliptical silicon arrays with anisotropic optical and wetting properties.

Wang T, Li X, Zhang J, Wang X, Zhang X, Zhang X, Zhu D, Hao Y, Ren Z, Yang B.

Langmuir. 2010 Aug 17;26(16):13715-21. doi: 10.1021/la1017505.

PMID:
20695625
12.

Metal-assisted chemical etching of silicon: a review.

Huang Z, Geyer N, Werner P, de Boor J, Gösele U.

Adv Mater. 2011 Jan 11;23(2):285-308. doi: 10.1002/adma.201001784. Review.

PMID:
20859941
13.

Fabrication of p-type silicon nanowire arrays with a high aspect ratio using electrochemical and alkaline etching.

Jang HS, Choi HJ, Kim JH.

J Nanosci Nanotechnol. 2012 Apr;12(4):3567-70.

PMID:
22849170
14.

Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly.

Farrell RA, Kinahan NT, Hansel S, Stuen KO, Petkov N, Shaw MT, West LE, Djara V, Dunne RJ, Varona OG, Gleeson PG, Jung SJ, Kim HY, Koleśnik MM, Lutz T, Murray CP, Holmes JD, Nealey PF, Duesberg GS, Krstić V, Morris MA.

Nanoscale. 2012 May 21;4(10):3228-36. doi: 10.1039/c2nr00018k. Epub 2012 Apr 5.

PMID:
22481430
15.

Electrochemical differential photoacoustic cell to study in situ the growing process of porous materials.

Gutiérrez A, Giraldo J, Velázquez-Hernández R, Mendoza-López ML, Espinosa-Arbeláez DG, del Real A, Rodríguez-García ME.

Rev Sci Instrum. 2010 Jan;81(1):013901. doi: 10.1063/1.3271238.

PMID:
20113107
16.

A sub-atmospheric chemical vapor deposition process for deposition of oxide liner in high aspect ratio through silicon vias.

Lisker M, Marschmeyer S, Kaynak M, Tekin I.

J Nanosci Nanotechnol. 2011 Sep;11(9):8061-7.

PMID:
22097530
17.

Preparation of porous n-type silicon sample plates for desorption/ionization on silicon mass spectrometry (DIOS-MS).

Tuomikoski S, Huikko K, Grigoras K, Ostman P, Kostiainen R, Baumann M, Abian J, Kotiaho T, Franssila S.

Lab Chip. 2002 Nov;2(4):247-53. Epub 2002 Oct 15.

PMID:
15100819
18.

Metal-assisted electrochemical etching of silicon.

Huang ZP, Geyer N, Liu LF, Li MY, Zhong P.

Nanotechnology. 2010 Nov 19;21(46):465301. doi: 10.1088/0957-4484/21/46/465301. Epub 2010 Oct 25.

PMID:
20972316
19.
20.

Novel top-down wafer-scale fabrication of single crystal silicon nanowires.

Tong HD, Chen S, van der Wiel WG, Carlen ET, van den Berg A.

Nano Lett. 2009 Mar;9(3):1015-22. doi: 10.1021/nl803181x.

PMID:
19199755

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