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Items: 1 to 20 of 148

1.

Early stages of growth of gold layers sputter deposited on glass and silicon substrates.

Malinský P, Slepička P, Hnatowicz V, Svorčík V.

Nanoscale Res Lett. 2012 May 6;7(1):241. doi: 10.1186/1556-276X-7-241.

2.

Structure analysis of sputter-coated and ion-beam sputter-coated films: a comparative study.

Kemmenoe BH, Bullock GR.

J Microsc. 1983 Nov;132(Pt 2):153-63.

PMID:
6358510
3.

Water as buffer material for gold nanocluster growth.

Gross E, Horowitz Y, Asscher M.

Langmuir. 2005 Sep 13;21(19):8892-8.

PMID:
16142975
4.

Atomic vapor deposition approach to In2O3 thin films.

Hellwig M, Parala H, Cybinksa J, Barreca D, Gasparotto A, Niermann B, Becker HW, Rogalla D, Feydt J, Irsen S, Mudring AV, Winter J, Fischer RA, Devi A.

J Nanosci Nanotechnol. 2011 Sep;11(9):8094-100.

PMID:
22097536
5.

Galvanic deposition of Pt clusters on silicon: effect of HF concentration and application as catalyst for silicon nanowire growth.

Cerruti M, Doerk G, Hernandez G, Carraro C, Maboudian R.

Langmuir. 2010 Jan 5;26(1):432-7. doi: 10.1021/la902032x.

PMID:
20038180
6.

Electrochemical deposition of polypyrrole nanolayers on discontinuous ultrathin gold films.

Mtsuko D, Avnon A, Lievonen J, Ahlskog M, Menon R.

Nanotechnology. 2008 Mar 26;19(12):125304. doi: 10.1088/0957-4484/19/12/125304. Epub 2008 Feb 20.

PMID:
21817725
7.

Growth of silicon nanoclusters on different substrates by plasma enhanced chemical vapor deposition.

Monroy BM, Santana G, Fandiõ J, Ortiz A, Alonso JC.

J Nanosci Nanotechnol. 2006 Dec;6(12):3752-5.

PMID:
17256325
8.

In situ stress evolution during and after sputter deposition of Al thin films.

Pletea M, Koch R, Wendrock H, Kaltofen R, Schmidt OG.

J Phys Condens Matter. 2009 Jun 3;21(22):225008. doi: 10.1088/0953-8984/21/22/225008. Epub 2009 May 11.

PMID:
21715772
9.
10.

Gold nanoparticles deposited on glass: physicochemical characterization and cytocompatibility.

Reznickova A, Novotna Z, Kasalkova NS, Svorcik V.

Nanoscale Res Lett. 2013 May 25;8(1):252. doi: 10.1186/1556-276X-8-252.

11.

Microstructural and compositional analysis of strontium-doped lead zirconate titanate thin films on gold-coated silicon substrates.

Sriram S, Bhaskaran M, Mitchell DR, Short KT, Holland AS, Mitchell A.

Microsc Microanal. 2009 Feb;15(1):30-5. doi: 10.1017/S1431927609090072.

PMID:
19144255
12.
13.

Surface properties of thin gold layers sputtered on polymers.

Kolská Z, Reznícková A, Kvítek O, Svorcík V.

J Nanosci Nanotechnol. 2012 Aug;12(8):6652-7.

PMID:
22962802
14.

Effect of the initial structure on the electrical property of crystalline silicon films deposited on glass by hot-wire chemical vapor deposition.

Chung YB, Lee SH, Bae SH, Park HK, Jung JS, Hwang NM.

J Nanosci Nanotechnol. 2012 Jul;12(7):5947-51.

PMID:
22966686
15.

Vacuum metal deposition: factors affecting normal and reverse development of latent fingerprints on polyethylene substrates.

Jones N, Stoilovic M, Lennard C, Roux C.

Forensic Sci Int. 2001 Jan 1;115(1-2):73-88.

PMID:
11056272
16.

MeV gold ion induced sputtered nanoparticles from gold nanostructures: dependence of incident flux and temperature.

Ghatak J, Sundaravel B, Nair KG, Satyam PV.

J Nanosci Nanotechnol. 2008 Aug;8(8):4318-21.

PMID:
19049225
17.

Variety of nanopatterns on different substrates using PS-b-PMMA and their applications.

Alam MM, Lee YR, Kim JY, Jung WG.

J Nanosci Nanotechnol. 2012 Feb;12(2):1634-7.

PMID:
22630017
18.
19.

Influence of the organic layer thickness in (metal-assisted) secondary ion mass spectrometry using Ga+ and C60+ projectiles.

Wehbe N, Mouhib T, Prabhakaran A, Bertrand P, Delcorte A.

J Am Soc Mass Spectrom. 2009 Dec;20(12):2294-303. doi: 10.1016/j.jasms.2009.08.022. Epub 2009 Sep 3.

20.

Size to density coupling of supported metallic clusters.

Gross E, Asscher M.

Phys Chem Chem Phys. 2009 Jan 28;11(4):710-6.

PMID:
19835094

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