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Items: 1 to 20 of 321

1.

Room-temperature formation of low refractive index silicon oxide films using atmospheric-pressure plasma.

Nakamura K, Yamaguchi Y, Yokoyama K, Higashida K, Ohmi H, Kakiuchi H, Yasutake K.

J Nanosci Nanotechnol. 2011 Apr;11(4):2851-5.

PMID:
21776642
2.

Study on the growth of heteroepitaxial cubic silicon carbide layers in atmospheric-pressure H2-based plasma.

Kakiuchi H, Ohmi H, Yasutake K.

J Nanosci Nanotechnol. 2011 Apr;11(4):2903-9.

PMID:
21776651
3.

Structural evolution of nanocrystalline silicon thin films synthesized in high-density, low-temperature reactive plasmas.

Cheng Q, Xu S, Ostrikov KK.

Nanotechnology. 2009 May 27;20(21):215606. doi: 10.1088/0957-4484/20/21/215606. Epub 2009 May 6.

PMID:
19423937
4.

All-nanoparticle thin-film coatings.

Lee D, Rubner MF, Cohen RE.

Nano Lett. 2006 Oct;6(10):2305-12. Erratum in: Nano Lett. 2007 May;7(5):1444.

PMID:
17034102
5.

Structural color in porous, superhydrophilic, and self-cleaning SiO2/TiO2 Bragg stacks.

Wu Z, Lee D, Rubner MF, Cohen RE.

Small. 2007 Aug;3(8):1445-51.

PMID:
17583907
6.
7.
8.

Highly conducting phosphorous doped Nc-Si:H thin films deposited at high deposition rate by hot-wire chemical vapor deposition method.

Waman VS, Kamble MM, Ghosh SS, Mayabadi A, Sathe VG, Amalnekar DP, Pathan HM, Jadkar SR.

J Nanosci Nanotechnol. 2012 Nov;12(11):8459-66.

PMID:
23421231
9.

Nonlinear optical absorption and switching properties of gold nanoparticle doped SiO2-TiO2 sol-gel films.

Venkatram N, Kumar RS, Rao DN, Medda SK, De S, De G.

J Nanosci Nanotechnol. 2006 Jul;6(7):1990-4.

PMID:
17025114
10.

Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor.

Remolina A, Monroy BM, García-Sánchez MF, Ponce A, Bizarro M, Alonso JC, Ortiz A, Santana G.

Nanotechnology. 2009 Jun 17;20(24):245604. doi: 10.1088/0957-4484/20/24/245604. Epub 2009 May 27.

PMID:
19471076
11.

Direct growth of doping-density-controlled hexagonal graphene on SiO2 substrate by rapid-heating plasma CVD.

Kato T, Hatakeyama R.

ACS Nano. 2012 Oct 23;6(10):8508-15. doi: 10.1021/nn302290z. Epub 2012 Sep 12.

PMID:
22971147
12.

Fabrication and characterization of nanopore array.

Fu Y, Bryan NK, Fatt LT.

J Nanosci Nanotechnol. 2006 Jul;6(7):1954-60.

PMID:
17025108
13.

Coating of diamond-like carbon nanofilm on alumina by microwave plasma enhanced chemical vapor deposition process.

Rattanasatien C, Tonanon N, Bhanthumnavin W, Paosawatyanyong B.

J Nanosci Nanotechnol. 2012 Jan;12(1):642-7.

PMID:
22524033
14.

Crystallization of amorphous Si nanoclusters in SiO(x) films using femtosecond laser pulse annealings.

Korchagina TT, Gutakovsky AK, Fedina LI, Neklyudova MA, Volodin VA.

J Nanosci Nanotechnol. 2012 Nov;12(11):8694-9.

PMID:
23421268
15.

Preparation of insulating SiO2 nanostructured thin films by the sol-gel process.

Hsieh TL, Chu AK, Huang WY.

J Nanosci Nanotechnol. 2013 Jan;13(1):279-87.

PMID:
23646727
16.

Graphene nanoribbon thin films using layer-by-layer assembly.

Zhu Y, Tour JM.

Nano Lett. 2010 Nov 10;10(11):4356-62. doi: 10.1021/nl101695g. Epub 2010 Oct 15.

PMID:
20949936
17.

The influence of deposition temperature on the correlation of Ge quantum dot positions in amorphous silica matrix.

Buljan M, Desnica UV, Drazić G, Ivanda M, Radić N, Dubcek P, Salamon K, Bernstorff S, Holý V.

Nanotechnology. 2009 Feb 25;20(8):085612. doi: 10.1088/0957-4484/20/8/085612. Epub 2009 Feb 3.

PMID:
19417460
18.

Study of nanocrystalline silicon films synthesized Below 100 degrees C by catalytic chemical vapor deposition.

Song TH, Keum KS, Hong WS.

J Nanosci Nanotechnol. 2013 Nov;13(11):7519-23.

PMID:
24245284
19.

Characteristics of nanocomposite ZrO2/Al2O3 films deposited by plasma-enhanced atomic layer deposition.

Yun SJ, Lim JW, Kim HT.

J Nanosci Nanotechnol. 2007 Nov;7(11):4180-4.

PMID:
18047146
20.

Double-layered TiO2-SiO2 nanostructured films with self-cleaning and antireflective properties.

Zhang X, Fujishima A, Jin M, Emeline AV, Murakami T.

J Phys Chem B. 2006 Dec 21;110(50):25142-8.

PMID:
17201053

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