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Items: 1 to 20 of 97

1.

Low-temperature fabrication of layered self-organized Ge clusters by RF-sputtering.

Pinto SR, Rolo AG, Buljan M, Chahboun A, Bernstorff S, Barradas NP, Alves E, Kashtiban RJ, Bangert U, Gomes MJ.

Nanoscale Res Lett. 2011 Apr 14;6(1):341. doi: 10.1186/1556-276X-6-341.

2.

Impact of annealing on surface morphology and photoluminescence of self-assembled Ge and Si quantum dots.

Samavati A, Othaman Z, Dabagh S, Ghoshal SK.

J Nanosci Nanotechnol. 2014 Jul;14(7):5266-71.

PMID:
24758014
3.

Stacked Ge nanocrystals with ultrathin SiO₂ separation layers.

Zschintzsch M, von Borany J, Jeutter NM, Mücklich A.

Nanotechnology. 2011 Nov 18;22(46):465302. doi: 10.1088/0957-4484/22/46/465302. Epub 2011 Oct 27.

PMID:
22032974
4.

Fabrication of multilayered Ge nanocrystals by magnetron sputtering and annealing.

Gao F, Green MA, Conibeer G, Cho EC, Huang Y, Pere-Wurfl I, Flynn C.

Nanotechnology. 2008 Nov 12;19(45):455611. doi: 10.1088/0957-4484/19/45/455611. Epub 2008 Oct 9.

PMID:
21832788
5.

Effect of Ge Content on the Formation of Ge Nanoclusters in Magnetron-Sputtered GeZrOx-Based Structures.

Khomenkova L, Lehninger D, Kondratenko O, Ponomaryov S, Gudymenko O, Tsybrii Z, Yukhymchuk V, Kladko V, von Borany J, Heitmann J.

Nanoscale Res Lett. 2017 Dec;12(1):196. doi: 10.1186/s11671-017-1960-9. Epub 2017 Mar 16.

6.

[Comparative study on photoluminescence from Ge/PS and Ge/SiO2 thin films].

Sun XJ, Ma SY, Wei JJ, Xu XL.

Guang Pu Xue Yu Guang Pu Fen Xi. 2008 Sep;28(9):2033-7. Chinese.

PMID:
19093555
7.

Ge-Si-O phase separation and Ge nanocrystal growth in Ge:SiO(x)/SiO(2) multilayers--a new dc magnetron approach.

Zschintzsch M, Sahle CJ, Borany Jv, Sternemann C, Mücklich A, Nyrow A, Schwamberger A, Tolan M.

Nanotechnology. 2011 Dec 2;22(48):485303. doi: 10.1088/0957-4484/22/48/485303. Epub 2011 Nov 9.

PMID:
22071321
8.

In situ x-ray reflectivity and grazing incidence x-ray diffraction study of L 1(0) ordering in (57)Fe/Pt multilayers.

Raghavendra Reddy V, Gupta A, Gome A, Leitenberger W, Pietsch U.

J Phys Condens Matter. 2009 May 6;21(18):186002. doi: 10.1088/0953-8984/21/18/186002. Epub 2009 Mar 31.

PMID:
21825468
9.

Structural and optical properties of ge nanocrystals embedded in Al2O3.

Caldelas P, Rolo AG, Chahboun A, Foss S, Levichev S, Finstad TG, Gomes MJ, Conde O.

J Nanosci Nanotechnol. 2008 Feb;8(2):572-6.

PMID:
18464372
10.

Crystallization behavior of silicon quantum dots in a silicon nitride matrix.

Ha R, Kim S, Kim HJ, Lee JC, Bae JS, Kim Y.

J Nanosci Nanotechnol. 2012 Feb;12(2):1448-52.

PMID:
22629976
11.

[Spectral Characteristics of Si Quantum Dots Embedded in SiN(x) Thin Films Prepared by Magnetron Co-Sputtering].

Chen XB, Yang W, Duan LF, Zhang LY, Yang PZ, Song ZN.

Guang Pu Xue Yu Guang Pu Fen Xi. 2015 Jul;35(7):1770-3. Chinese.

PMID:
26717722
12.

Al-induced crystallization of amorphous Ge and formation of fractal Ge micro-/nanoclusters.

Li Q, Chen C, Chen Z, Jiao Z, Wu M, Shek CH, Wu CM, Lai JK.

Inorg Chem. 2012 Aug 6;51(15):8473-8. doi: 10.1021/ic301046z. Epub 2012 Jul 17.

PMID:
22803828
13.

Fabrication and characterization of silicon quantum dots in Si-rich silicon carbide films.

Chang GR, Ma F, Ma D, Xu K.

J Nanosci Nanotechnol. 2011 Dec;11(12):10824-8.

PMID:
22409005
14.

Ordering of lipid A-monophosphate clusters in aqueous solutions.

Faunce CA, Reichelt H, Quitschau P, Paradies HH.

J Chem Phys. 2007 Sep 21;127(11):115103.

PMID:
17887884
15.

Effects of thermal annealing on the structural and optical properties of carbon-implanted SiO2.

Poudel PR, Paramo JA, Poudel PP, Diercks DR, Strzhemechny YM, Rout B, McDaniel FD.

J Nanosci Nanotechnol. 2012 Mar;12(3):1835-42.

PMID:
22754988
16.

Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering.

van Dijk K, Schaeken HG, Wolke JC, Marée CH, Habraken FH, Verhoeven J, Jansen JA.

J Biomed Mater Res. 1995 Feb;29(2):269-76.

PMID:
7738075
17.

Influence of annealing temperature on RF magnetron sputtered calcium phosphate coatings.

van Dijk K, Schaeken HG, Wolke JG, Jansen JA.

Biomaterials. 1996 Feb;17(4):405-10.

PMID:
8938234
18.

Intrinsic p type ZnO films deposited by rf magnetron sputtering.

Wang J, Martins R, Barradas NP, Alves E, Monteiro T, Peres M, Elamurugu E, Fortunato E.

J Nanosci Nanotechnol. 2009 Feb;9(2):813-6.

PMID:
19441398
19.

Continuous and nanostructured TiO2 films grown by dc sputtering magnetron.

Sánchez O, Vergara L, Font AC, de Melo O, Sanz R, Hernández-Vélez M.

J Nanosci Nanotechnol. 2012 Dec;12(12):9148-55.

PMID:
23447970
20.

Plasmonic properties of Ag nanoparticles embedded in GeO2-SiO2 matrix by atom beam sputtering.

Mohapatra S.

Phys Chem Chem Phys. 2016 Feb 7;18(5):3878-83. doi: 10.1039/c5cp05345e.

PMID:
26766559

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