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Items: 1 to 20 of 187

1.

Sub-70 nm resolution tabletop microscopy at 13.8 nm using a compact laser-plasma EUV source.

Wachulak PW, Bartnik A, Fiedorowicz H.

Opt Lett. 2010 Jul 15;35(14):2337-9. doi: 10.1364/OL.35.002337.

PMID:
20634822
2.

A stand-alone compact EUV microscope based on gas-puff target source.

Torrisi A, Wachulak P, Węgrzyński Ł, Fok T, Bartnik A, Parkman T, Vondrová Š, Turňová J, Jankiewicz BJ, Bartosewicz B, Fiedorowicz H.

J Microsc. 2017 Feb;265(2):251-260. doi: 10.1111/jmi.12494. Epub 2016 Oct 21.

PMID:
27766644
3.

A 50 nm spatial resolution EUV imaging-resolution dependence on object thickness and illumination bandwidth.

Wachulak PW, Bartnik A, Fiedorowicz H, Kostecki J.

Opt Express. 2011 May 9;19(10):9541-50. doi: 10.1364/OE.19.009541.

PMID:
21643212
4.

Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light.

Vaschenko G, Brewer C, Brizuela F, Wang Y, Larotonda MA, Luther BM, Marconi MC, Rocca JJ, Menoni CS, Anderson EH, Chao W, Harteneck BD, Liddle JA, Liu Y, Attwood DT.

Opt Lett. 2006 May 1;31(9):1214-6.

PMID:
16642063
5.

Compact soft x-ray transmission microscopy with sub-50 nm spatial resolution.

Kim KW, Kwon Y, Nam KY, Lim JH, Kim KG, Chon KS, Kim BH, Kim DE, Kim J, Ahn BN, Shin HJ, Rah S, Kim KH, Chae JS, Gweon DG, Kang DW, Kang SH, Min JY, Choi KS, Yoon SE, Kim EA, Namba Y, Yoon KH.

Phys Med Biol. 2006 Mar 21;51(6):N99-107. Epub 2006 Feb 21.

PMID:
16510949
6.

Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks.

Brizuela F, Carbajo S, Sakdinawat A, Alessi D, Martz DH, Wang Y, Luther B, Goldberg KA, Mochi I, Attwood DT, La Fontaine B, Rocca JJ, Menoni CS.

Opt Express. 2010 Jul 5;18(14):14467-73. doi: 10.1364/OE.18.014467.

PMID:
20639931
7.

Extreme ultraviolet spectroscopy diagnostics of low-temperature plasmas based on a sliced multilayer grating and glass capillary optics.

Kantsyrev VL, Safronova AS, Williamson KM, Wilcox P, Ouart ND, Yilmaz MF, Struve KW, Voronov DL, Feshchenko RM, Artyukov IA, Vinogradov AV.

Rev Sci Instrum. 2008 Oct;79(10):10F542. doi: 10.1063/1.2957934.

PMID:
19044684
8.

Achromatic Fresnel optics for wideband extreme-ultraviolet and X-ray imaging.

Wang Y, Yun W, Jacobsen C.

Nature. 2003 Jul 3;424(6944):50-3.

PMID:
12840754
9.

Compact water-window transmission X-ray microscopy.

Berglund M, Rymell L, Peuker M, Wilhein T, Hertz HM.

J Microsc. 2000 Mar;197(Pt 3):268-73.

10.

Generation of spatially coherent light at extreme ultraviolet wavelengths.

Bartels RA, Paul A, Green H, Kapteyn HC, Murnane MM, Backus S, Christov IP, Liu Y, Attwood D, Jacobsen C.

Science. 2002 Jul 19;297(5580):376-8.

11.

High-resolution compact X-ray microscopy.

Takman PA, Stollberg H, Johansson GA, Holmberg A, Lindblom M, Hertz HM.

J Microsc. 2007 May;226(Pt 2):175-81.

12.

Extreme-ultraviolet lensless Fourier-transform holography.

Lee SH, Naulleau P, Goldberg KA, Cho CH, Jeong S, Bokor J.

Appl Opt. 2001 Jun 1;40(16):2655-61.

PMID:
18357280
13.

High-resolution Fresnel zone plate fabrication by achromatic spatial frequency multiplication with extreme ultraviolet radiation.

Sarkar SS, Solak HH, Saidani M, David C, van der Veen JF.

Opt Lett. 2011 May 15;36(10):1860-2. doi: 10.1364/OL.36.001860.

PMID:
21593915
14.

High throughput and wide field of view EUV microscope for blur-free one-shot imaging of living organisms.

Ejima T, Ishida F, Murata H, Toyoda M, Harada T, Tsuru T, Hatano T, Yanagihara M, Yamamoto M, Mizutani H.

Opt Express. 2010 Mar 29;18(7):7203-9. doi: 10.1364/OE.18.007203.

PMID:
20389741
15.

Tabletop single-shot extreme ultraviolet Fourier transform holography of an extended object.

Malm EB, Monserud NC, Brown CG, Wachulak PW, Xu H, Balakrishnan G, Chao W, Anderson E, Marconi MC.

Opt Express. 2013 Apr 22;21(8):9959-66. doi: 10.1364/OE.21.009959.

PMID:
23609701
16.

Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination.

Brizuela F, Wang Y, Brewer CA, Pedaci F, Chao W, Anderson EH, Liu Y, Goldberg KA, Naulleau P, Wachulak P, Marconi MC, Attwood DT, Rocca JJ, Menoni CS.

Opt Lett. 2009 Feb 1;34(3):271-3.

PMID:
19183628
17.

At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy.

Lin J, Weber N, Maul J, Hendel S, Rott K, Merkel M, Schoenhense G, Kleineberg U.

Opt Lett. 2007 Jul 1;32(13):1875-7.

PMID:
17603599
18.

Infrared suppression by hybrid EUV multilayer--IR etalon structures.

Medvedev VV, Yakshin AE, van de Kruijs RW, Krivtsun VM, Yakunin AM, Koshelev KN, Bijkerk F.

Opt Lett. 2011 Sep 1;36(17):3344-6. doi: 10.1364/OL.36.003344.

PMID:
21886205
19.

Improved emission uniformity from a liquid-jet laser-plasma extreme-ultraviolet source.

Hansson BA, Mosesson S, Hertz HM.

Appl Opt. 2004 Oct 10;43(29):5452-7.

PMID:
15508601
20.

[The experiment study on the resolution of electro-optical imaging system at EUV wave band].

Xue LL, Chen B, Li YM.

Guang Pu Xue Yu Guang Pu Fen Xi. 2004 May;24(5):529-31. Chinese.

PMID:
15769037

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