Format
Sort by
Items per page

Send to

Choose Destination

Links from PubMed

Items: 1 to 20 of 93

1.

Polarization-sensitive printing of surface plasmon interferences.

Derouard M, Hazart J, Lérondel G, Bachelot R, Adam PM, Royer P.

Opt Express. 2007 Apr 2;15(7):4238-46.

PMID:
19532668
2.

Visualization of surface plasmon interference by imprinting intensity patterns on a photosensitive polymer.

König T, Santer S.

Nanotechnology. 2012 Dec 7;23(48):485304. doi: 10.1088/0957-4484/23/48/485304. Epub 2012 Nov 5.

PMID:
23124330
3.

Near-field photochemical imaging of noble metal nanostructures.

Hubert C, Rumyantseva A, Lerondel G, Grand J, Kostcheev S, Billot L, Vial A, Bachelot R, Royer P, Chang SH, Gray SK, Wiederrecht GP, Schatz GC.

Nano Lett. 2005 Apr;5(4):615-9.

PMID:
15826096
4.

Mapping a plasmonic hologram with photosensitive polymer films: standing versus propagating waves.

Papke T, Yadavalli NS, Henkel C, Santer S.

ACS Appl Mater Interfaces. 2014 Aug 27;6(16):14174-80. doi: 10.1021/am503501y. Epub 2014 Aug 8.

PMID:
25046798
5.

Stretching and distortion of a photosensitive polymer film by surface plasmon generated near fields in the vicinity of a nanometer sized metal pin hole.

König T, Santer S.

Nanotechnology. 2012 Apr 20;23(15):155301. doi: 10.1088/0957-4484/23/15/155301. Epub 2012 Mar 22.

PMID:
22436938
6.

Controlled topography change of subdiffraction structures based on photosensitive polymer films induced by surface plasmon polaritons.

König T, Tsukruk VV, Santer S.

ACS Appl Mater Interfaces. 2013 Jul 10;5(13):6009-16. doi: 10.1021/am400712r. Epub 2013 Jun 5.

PMID:
23701312
7.

Electro-nanopatterning of surface relief gratings on azobenzene layer-by-layer ultrathin films by current-sensing atomic force microscopy.

Baba A, Jiang G, Park KM, Park JY, Shin HK, Advincula R.

J Phys Chem B. 2006 Sep 7;110(35):17309-14.

PMID:
16942064
8.

Plasmonic interference nanolithography with a double-layer planar silver lens structure.

Zeng B, Yang X, Wang C, Luo X.

Opt Express. 2009 Sep 14;17(19):16783-91. doi: 10.1364/OE.17.016783.

PMID:
19770895
9.

Near-field imaging of surface plasmon on gold nano-dots fabricated by scanning probe lithography.

Kim J, Kim J, Song KI, Lee SQ, Kim EU, Choi SE, Lee Y, Park KH.

J Microsc. 2003 Mar;209(Pt 3):236-40.

10.

Subwavelength photolithography based on surface-plasmon polariton resonance.

Luo X, Ishihara T.

Opt Express. 2004 Jul 12;12(14):3055-65.

PMID:
19483824
11.

Metallic nanodot arrays by stencil lithography for plasmonic biosensing applications.

Vazquez-Mena O, Sannomiya T, Villanueva LG, Voros J, Brugger J.

ACS Nano. 2011 Feb 22;5(2):844-53. doi: 10.1021/nn1019253. Epub 2010 Dec 30.

PMID:
21192666
12.

Surface plasmon interference nanolithography.

Liu ZW, Wei QH, Zhang X.

Nano Lett. 2005 May;5(5):957-61.

PMID:
15884902
13.

Computational Nanopatterning in the Plasmonic Metamaterials for Diffraction Limit.

Kim SK.

J Nanosci Nanotechnol. 2015 Feb;15(2):1368-74.

PMID:
26353657
14.

Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity.

Ge W, Wang C, Xue Y, Cao B, Zhang B, Xu K.

Opt Express. 2011 Mar 28;19(7):6714-23. doi: 10.1364/OE.19.006714.

PMID:
21451698
15.

Electrostatic nanolithography in polymers using atomic force microscopy.

Lyuksyutov SF, Vaia RA, Paramonov PB, Juhl S, Waterhouse L, Ralich RM, Sigalov G, Sancaktar E.

Nat Mater. 2003 Jul;2(7):468-72.

PMID:
12819776
16.

Broad band two-dimensional manipulation of surface plasmons.

Liu Z, Wang Y, Yao J, Lee H, Srituravanich W, Zhang X.

Nano Lett. 2009 Jan;9(1):462-6. doi: 10.1021/nl803460g.

PMID:
19099461
17.
18.

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.

Grigorescu AE, Hagen CW.

Nanotechnology. 2009 Jul 22;20(29):292001. doi: 10.1088/0957-4484/20/29/292001. Epub 2009 Jul 1. Review.

PMID:
19567961
19.

Virus-templated photoimprint on the surface of an azobenzene-containing polymer.

Ikawa T, Kato Y, Yamada T, Shiozawa M, Narita M, Mouri M, Hoshino F, Watanabe O, Tawata M, Shimoyama H.

Langmuir. 2010 Aug 3;26(15):12673-9. doi: 10.1021/la101229p.

PMID:
20604579
20.

Breaking the feature sizes down to sub-22 nm by plasmonic interference lithography using dielectric-metal multilayer.

Yang X, Zeng B, Wang C, Luo X.

Opt Express. 2009 Nov 23;17(24):21560-5. doi: 10.1364/OE.17.021560.

PMID:
19997397

Supplemental Content

Support Center