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Items: 1 to 20 of 87

1.

Energy flow in light-coupling masks for lensless optical lithography.

Martin O, Piller N, Schmid H, Biebuyck H, Michel B.

Opt Express. 1998 Sep 28;3(7):280-5.

PMID:
19384370
2.

Fabrication of mid-infrared frequency-selective surfaces by soft lithography.

Paul KE, Zhu C, Love JC, Whitesides GM.

Appl Opt. 2001 Sep 1;40(25):4557-61.

PMID:
18360497
3.

Influence of the mask magnification on imaging in hyper-NA lithography.

Lin CH, Chen HL, Ko FH.

J Opt Soc Am A Opt Image Sci Vis. 2007 Jun;24(6):1633-40.

PMID:
17491631
4.
5.

Laser parallel nanofabrication by single femtosecond pulse near-field ablation using photoresist masks.

Jipa F, Dinescu A, Filipescu M, Anghel I, Zamfirescu M, Dabu R.

Opt Express. 2014 Feb 10;22(3):3356-61. doi: 10.1364/OE.22.003356.

PMID:
24663626
6.

High-resolution laser lithography system based on two-dimensional acousto-optic deflection.

Koechlin M, Poberaj G, Günter P.

Rev Sci Instrum. 2009 Aug;80(8):085105. doi: 10.1063/1.3202274.

PMID:
19725679
7.

Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glass.

Gimkiewicz C, Hagedorn D, Jahns J, Kley EB, Thoma F.

Appl Opt. 1999 May 10;38(14):2986-90.

PMID:
18319880
8.

Programmable nanolithography with plasmon nanoparticle arrays.

Koenderink AF, Hernández JV, Robicheaux F, Noordam LD, Polman A.

Nano Lett. 2007 Mar;7(3):745-9. Epub 2007 Feb 22.

PMID:
17315939
9.

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography.

Bourgin Y, Siefke T, Käsebier T, Genevée P, Szeghalmi A, Kley EB, Zeitner UD.

Opt Express. 2015 Jun 29;23(13):16628-37. doi: 10.1364/OE.23.016628.

PMID:
26191675
10.
11.

Evidence of speckle in extreme-UV lithography.

Pret AV, Gronheid R, Engelen J, Yan PY, Leeson MJ, Younkin TR.

Opt Express. 2012 Nov 5;20(23):25970-8. doi: 10.1364/OE.20.025970.

PMID:
23187412
12.
13.

Sub-10 nm patterning using EUV interference lithography.

Päivänranta B, Langner A, Kirk E, David C, Ekinci Y.

Nanotechnology. 2011 Sep 16;22(37):375302. doi: 10.1088/0957-4484/22/37/375302. Epub 2011 Aug 19.

PMID:
21852737
14.

Advanced mask aligner lithography: new illumination system.

Voelkel R, Vogler U, Bich A, Pernet P, Weible KJ, Hornung M, Zoberbier R, Cullmann E, Stuerzebecher L, Harzendorf T, Zeitner UD.

Opt Express. 2010 Sep 27;18(20):20968-78. doi: 10.1364/OE.18.020968.

PMID:
20940992
15.

Colloidal lithography--the art of nanochemical patterning.

Zhang G, Wang D.

Chem Asian J. 2009 Feb 2;4(2):236-45. doi: 10.1002/asia.200800298.

PMID:
18988237
16.

Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure.

Xu D, Chen KP, Ohlinger K, Lin Y.

Nanotechnology. 2011 Jan 21;22(3):035303. doi: 10.1088/0957-4484/22/3/035303. Epub 2010 Dec 9.

PMID:
21149952
17.

Numerical feasibility study of the fabrication of subwavelength structure by mask lithography.

Ichikawa H, Kikuta H.

J Opt Soc Am A Opt Image Sci Vis. 2001 May;18(5):1093-100.

PMID:
11336212
19.

Lensless CCD-based fluorometer using a micromachined optical Söller collimator.

Balsam J, Ossandon M, Kostov Y, Bruck HA, Rasooly A.

Lab Chip. 2011 Mar 7;11(5):941-9. doi: 10.1039/c0lc00431f. Epub 2011 Jan 17.

PMID:
21243150
20.

PSM design for inverse lithography with partially coherent illumination.

Ma X, Arce GR.

Opt Express. 2008 Nov 24;16(24):20126-41.

PMID:
19030098

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