Format
Sort by
Items per page

Send to

Choose Destination

Links from PubMed

Items: 1 to 20 of 135

1.

Aberration measurement of projection optics in lithographic tools by use of an alternating phase-shifting mask.

Wang F, Wang X, Ma M, Zhang D, Shi W, Hu J.

Appl Opt. 2006 Jan 10;45(2):281-7.

PMID:
16422158
2.
3.

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image.

Peng B, Wang X, Qiu Z, Cao Y, Duan L.

Appl Opt. 2010 May 20;49(15):2753-60. doi: 10.1364/AO.49.002753.

PMID:
20490235
4.
5.

Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings.

Yuan Q, Wang X, Qiu Z, Wang F, Ma M, He L.

Opt Express. 2007 Nov 26;15(24):15878-85.

PMID:
19550874
6.

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width.

Qiu Z, Wang X, Yuan Q, Wang F.

Appl Opt. 2009 Jan 10;48(2):261-9.

PMID:
19137036
7.
8.
9.

Aberration measurement from specific photolithographic images: a different approach.

Nomura H, Tawarayama K, Kohno T.

Appl Opt. 2000 Mar 1;39(7):1136-47.

PMID:
18337995
10.

Analytical approach to the impact of polarization aberration on lithographic imaging.

Tu Y, Wang X, Li S, Cao Y.

Opt Lett. 2012 Jun 1;37(11):2061-3. doi: 10.1364/OL.37.002061.

PMID:
22660121
11.
12.

Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model.

Liu S, Xu S, Wu X, Liu W.

Opt Express. 2012 Jun 18;20(13):14272-83. doi: 10.1364/OE.20.014272.

PMID:
22714489
13.

Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging.

Peng B, Wang X, Qiu Z, Yuan Q, Cao Y.

Opt Lett. 2010 May 1;35(9):1404-6. doi: 10.1364/OL.35.001404.

PMID:
20436584
14.

Optical aberrations in the mouse eye.

de la Cera EG, Rodríguez G, Llorente L, Schaeffel F, Marcos S.

Vision Res. 2006 Aug;46(16):2546-53. Epub 2006 Mar 3.

15.

Measurement of lens aberrations by means of image displacements in beam-tilt series

Steinecker A, Mader W.

Ultramicroscopy. 2000 Apr;81(3-4):149-61.

PMID:
10782640
16.

General analytical expressions for the impact of polarization aberration on lithographic imaging under linearly polarized illumination.

Shen L, Wang X, Li S, Yan G, Zhu B, Zhang H.

J Opt Soc Am A Opt Image Sci Vis. 2016 Jun 1;33(6):1112-9. doi: 10.1364/JOSAA.33.001112.

PMID:
27409438
17.

Laser in situ keratomileusis disrupts the aberration compensation mechanism of the human eye.

Benito A, Redondo M, Artal P.

Am J Ophthalmol. 2009 Mar;147(3):424-431.e1. doi: 10.1016/j.ajo.2008.09.027. Epub 2008 Dec 5.

PMID:
19058779
18.

Focus measurement with a simple pattern design.

Ku CY, Lei TF, Lin HK.

Appl Opt. 2001 Jun 1;40(16):2662-9.

PMID:
18357281
19.

Generalized formulations for aerial image based lens aberration metrology in lithographic tools with arbitrarily shaped illumination sources.

Liu W, Liu S, Shi T, Tang Z.

Opt Express. 2010 Sep 13;18(19):20096-104. doi: 10.1364/OE.18.020096.

PMID:
20940899
20.

Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks.

Sung J, Pitchumani M, Johnson EG.

Appl Opt. 2003 Apr 10;42(11):1987-95.

PMID:
12699345

Supplemental Content

Support Center