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Items: 1 to 20 of 391

1.

Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation.

Ristau D, Günster S, Bosch S, Duparré A, Masetti E, Ferré-Borrull J, Kiriakidis G, Peiró F, Quesnel E, Tikhonravov A.

Appl Opt. 2002 Jun 1;41(16):3196-204.

PMID:
12064402
2.

Development of optical coatings for 157-nm lithography. I. Coating materials.

Niisaka S, Saito T, Saito J, Tanaka A, Matsumoto A, Otani M, Biro R, Ouchi C, Hasegawa M, Suzuki Y, Sone K.

Appl Opt. 2002 Jun 1;41(16):3242-7.

PMID:
12064408
3.

Vacuum ultraviolet coatings of Al protected with MgF(2) prepared both by ion-beam sputtering and by evaporation.

Fernández-Perea M, Larruquert JI, Aznárez JA, Pons A, Méndez JA.

Appl Opt. 2007 Aug 1;46(22):4871-8.

PMID:
17676090
4.

Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering.

Yoshida T, Nishimoto K, Sekine K, Etoh K.

Appl Opt. 2006 Mar 1;45(7):1375-9.

PMID:
16539238
5.

Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat.

Liu MC, Lee CC, Kaneko M, Nakahira K, Takano Y.

Appl Opt. 2006 Mar 1;45(7):1368-74.

PMID:
16539237
6.

Microstructure of magnesium fluoride films deposited by boat evaporation at 193 nm.

Liu MC, Lee CC, Kaneko M, Nakahira K, Takano Y.

Appl Opt. 2006 Oct 1;45(28):7319-24.

PMID:
16983421
7.

Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering.

Gallais L, Capoulade J, Natoli JY, Commandré M, Cathelinaud M, Koc C, Lequime M.

Appl Opt. 2008 May 1;47(13):C107-13.

PMID:
18449230
8.
9.

Mechanical characteristics of optical coatings prepared by various techniques: a comparative study.

Klemberg-Sapieha JE, Oberste-Berghaus J, Martinu L, Blacker R, Stevenson I, Sadkhin G, Morton D, McEldowney S, Klinger R, Martin PJ, Court N, Dligatch S, Gross M, Netterfield RP.

Appl Opt. 2004 May 1;43(13):2670-9.

PMID:
15130006
10.

Influence of ion assistance on LaF3 films deposited by molybdenum boat evaporation.

Liu MC, Lee CC, Kaneko M, Nakahira K, Takano Y.

Appl Opt. 2012 May 20;51(15):2865-9. doi: 10.1364/AO.51.002865.

PMID:
22614587
11.

Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering.

Lee CC, Tien CL, Hsu JC.

Appl Opt. 2002 Apr 1;41(10):2043-7.

PMID:
11936809
12.

Deposition and spectral performance of an inhomogeneous broadband wide-angular antireflective coating.

Janicki V, Gäbler D, Wilbrandt S, Leitel R, Stenzel O, Kaiser N, Lappschies M, Görtz B, Ristau D, Rickers C, Vergöhl M.

Appl Opt. 2006 Oct 20;45(30):7851-7.

PMID:
17068519
13.

Topical meeting on optical interference coatings (OIC'2001): manufacturing problem.

Dobrowolski JA, Browning S, Jacobson M, Nadal M.

Appl Opt. 2002 Jun 1;41(16):3039-52.

PMID:
12064379
14.

Effect of stress on performance of dense wavelength division multiplexing filters: optical properties.

Prins SL, Barron AC, Herrmann WC, McNeil JR.

Appl Opt. 2004 Jan 20;43(3):626-32.

PMID:
14765923
15.

Influence of thermal annealing and ultraviolet light irradiation on LaF3 thin films at 193 nm.

Lee CC, Liu MC, Kaneko M, Nakahira K, Takano Y.

Appl Opt. 2005 Nov 10;44(32):6921-6.

PMID:
16294967
17.
18.

Optical and structural properties of LaF3 thin films.

Bischoff M, Gäbler D, Kaiser N, Chuvilin A, Kaiser U, Tünnermann A.

Appl Opt. 2008 May 1;47(13):C157-61.

PMID:
18449239
19.

Ion beam sputtering of fluoride thin films for 193 nm applications.

Ode A.

Appl Opt. 2014 Feb 1;53(4):A330-3. doi: 10.1364/AO.53.00A330.

PMID:
24514235
20.

Effect of stress on performance of dense wavelength division multiplexing filters: thermal properties.

Prins SL, Barron AC, Herrmann WC, McNeil JR.

Appl Opt. 2004 Jan 20;43(3):633-7.

PMID:
14765924
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