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Items: 1 to 20 of 244

1.

Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition.

Edy R, Huang X, Guo Y, Zhang J, Shi J.

Nanoscale Res Lett. 2013 Feb 15;8(1):79. doi: 10.1186/1556-276X-8-79.

2.

Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks.

Xiang Y, Zhou C, Jia E, Wang W.

Nanoscale Res Lett. 2015 Mar 19;10:137. doi: 10.1186/s11671-015-0798-2. eCollection 2015.

3.

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films.

Haeberle J, Henkel K, Gargouri H, Naumann F, Gruska B, Arens M, Tallarida M, Schmeißer D.

Beilstein J Nanotechnol. 2013 Nov 8;4:732-42. doi: 10.3762/bjnano.4.83. eCollection 2013.

4.

Low-temperature roll-to-roll atmospheric atomic layer deposition of Al₂O₃ thin films.

Ali K, Choi KH.

Langmuir. 2014 Dec 2;30(47):14195-203. doi: 10.1021/la503406v. Epub 2014 Nov 19.

PMID:
25407477
5.

Enhanced Barrier Performance of Engineered Paper by Atomic Layer Deposited Al2O3 Thin Films.

Mirvakili MN, Van Bui H, van Ommen JR, Hatzikiriakos SG, Englezos P.

ACS Appl Mater Interfaces. 2016 Jun 1;8(21):13590-600. doi: 10.1021/acsami.6b02292. Epub 2016 May 18.

PMID:
27165172
6.

Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment.

Young MJ, Musgrave CB, George SM.

ACS Appl Mater Interfaces. 2015 Jun 10;7(22):12030-7. doi: 10.1021/acsami.5b02167. Epub 2015 May 28.

PMID:
25965097
7.

Interface Electrical Properties of Al2O3 Thin Films on Graphene Obtained by Atomic Layer Deposition with an in Situ Seedlike Layer.

Fisichella G, Schilirò E, Di Franco S, Fiorenza P, Lo Nigro R, Roccaforte F, Ravesi S, Giannazzo F.

ACS Appl Mater Interfaces. 2017 Mar 1;9(8):7761-7771. doi: 10.1021/acsami.6b15190. Epub 2017 Feb 13.

PMID:
28135063
8.

Characteristics of Al-doped ZnO films grown by atomic layer deposition for silicon nanowire photovoltaic device.

Oh BY, Han JW, Seo DS, Kim KY, Baek SH, Jang HS, Kim JH.

J Nanosci Nanotechnol. 2012 Jul;12(7):5330-5.

PMID:
22966566
9.

Al2O3 on Black Phosphorus by Atomic Layer Deposition: An in Situ Interface Study.

Zhu H, McDonnell S, Qin X, Azcatl A, Cheng L, Addou R, Kim J, Ye PD, Wallace RM.

ACS Appl Mater Interfaces. 2015 Jun 17;7(23):13038-43. doi: 10.1021/acsami.5b03192. Epub 2015 Jun 8.

PMID:
26016806
10.
11.

Conformal atomic layer deposition of alumina on millimeter tall, vertically-aligned carbon nanotube arrays.

Stano KL, Carroll M, Padbury R, McCord M, Jur JS, Bradford PD.

ACS Appl Mater Interfaces. 2014 Nov 12;6(21):19135-43. doi: 10.1021/am505107s. Epub 2014 Oct 15.

PMID:
25275708
12.

Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser-induced damage thresholds.

Wei Y, Pan F, Zhang Q, Ma P.

Nanoscale Res Lett. 2015 Feb 6;10:44. doi: 10.1186/s11671-015-0731-8. eCollection 2015.

13.

Atomic layer deposition ultra-barriers for electronic applications-strategies and implementation.

Carcia PF, McLean RS, Sauer BB, Reilly MH.

J Nanosci Nanotechnol. 2011 Sep;11(9):7994-8.

PMID:
22097518
14.

Improvement of Al2O3 films on graphene grown by atomic layer deposition with pre-H2O treatment.

Zheng L, Cheng X, Cao D, Wang G, Wang Z, Xu D, Xia C, Shen L, Yu Y, Shen D.

ACS Appl Mater Interfaces. 2014 May 28;6(10):7014-9. doi: 10.1021/am501690g. Epub 2014 May 7.

PMID:
24786612
15.

Nucleation and growth mechanisms of Al2O3 atomic layerdeposition on synthetic polycrystalline MoS2.

Zhang H, Chiappe D, Meersschaut J, Conard T, Franquet A, Nuytten T, Mannarino M, Radu I, Vandervorst W, Delabie A.

J Chem Phys. 2017 Feb 7;146(5):052810. doi: 10.1063/1.4967406.

PMID:
28178804
16.

The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition.

Wang ZY, Zhang RJ, Lu HL, Chen X, Sun Y, Zhang Y, Wei YF, Xu JP, Wang SY, Zheng YX, Chen LY.

Nanoscale Res Lett. 2015 Feb 6;10:46. doi: 10.1186/s11671-015-0757-y. eCollection 2015.

17.

Platinum-Enhanced Electron Transfer and Surface Passivation through Ultrathin Film Aluminum Oxide (Al₂O₃) on Si(111)-CH₃ Photoelectrodes.

Kim HJ, Kearney KL, Le LH, Pekarek RT, Rose MJ.

ACS Appl Mater Interfaces. 2015 Apr 29;7(16):8572-84. doi: 10.1021/acsami.5b00376. Epub 2015 Apr 16.

PMID:
25880534
18.

A flexible transparent gas barrier film employing the method of mixing ALD/MLD-grown Al2O3 and alucone layers.

Xiao W, Hui DY, Zheng C, Yu D, Qiang YY, Ping C, Xiang CL, Yi Z.

Nanoscale Res Lett. 2015 Mar 14;10:130. doi: 10.1186/s11671-015-0838-y. eCollection 2015.

19.

Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer deposition.

Zheng L, Cheng X, Yu Y, Xie Y, Li X, Wang Z.

Phys Chem Chem Phys. 2015 Feb 7;17(5):3179-85. doi: 10.1039/c4cp04957h. Epub 2014 Dec 18.

PMID:
25519447
20.

Atomic layer deposition on gram quantities of multi-walled carbon nanotubes.

Cavanagh AS, Wilson CA, Weimer AW, George SM.

Nanotechnology. 2009 Jun 24;20(25):255602. doi: 10.1088/0957-4484/20/25/255602. Epub 2009 Jun 3.

PMID:
19491468

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