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Items: 1 to 20 of 147

1.

Multiscale roughness in optical multilayers: atomic force microscopy and light scattering.

Deumié C, Richier R, Dumas P, Amra C.

Appl Opt. 1996 Oct 1;35(28):5583-94. doi: 10.1364/AO.35.005583.

PMID:
21127561
2.

Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers.

Trost M, Schröder S, Feigl T, Duparré A, Tünnermann A.

Appl Opt. 2011 Mar 20;50(9):C148-53. doi: 10.1364/AO.50.00C148.

PMID:
21460930
3.

From light scattering to the microstructure of thin-film multilayers.

Amra C.

Appl Opt. 1993 Oct 1;32(28):5481-91. doi: 10.1364/AO.32.005481.

PMID:
20856359
4.

Comparative study of the roughness of optical surfaces and thin films by use of X-ray scattering and atomic force microscopy.

Asadchikov VE, Duparré A, Jakobs S, Karabekov AY, Kozhevnikov IV, Krivonosov YS.

Appl Opt. 1999 Feb 1;38(4):684-91.

PMID:
18305664
5.

Roughness evolution and scatter losses of multilayers for 193 nm optics.

Schröder S, Duparré A, Tünnermann A.

Appl Opt. 2008 May 1;47(13):C88-97.

PMID:
18449277
6.

Ion-assisted deposition of oxide materials at room temperature by use of different ion sources.

Niederwald H, Laux S, Kennedy M, Schallenberg U, Duparré A, Mertin M, Kaiser N, Ristau D.

Appl Opt. 1999 Jun 1;38(16):3610-3.

PMID:
18319964
7.

Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering.

Gallais L, Capoulade J, Natoli JY, Commandré M, Cathelinaud M, Koc C, Lequime M.

Appl Opt. 2008 May 1;47(13):C107-13.

PMID:
18449230
8.

Interfacial roughness and related scatter in ultraviolet optical coatings: a systematic experimental approach.

Jakobs S, Duparré A, Truckenbrodt H.

Appl Opt. 1998 Mar 1;37(7):1180-93.

PMID:
18268703
9.

Scattering reduction through oblique multilayer deposition.

Trost M, Herffurth T, Schröder S, Duparré A, Tünnermann A.

Appl Opt. 2014 Feb 1;53(4):A197-204. doi: 10.1364/AO.53.00A197.

PMID:
24514215
10.

Defect formation in hafnium dioxide thin films.

Reicher D, Black P, Jungling K.

Appl Opt. 2000 Apr 1;39(10):1589-99.

PMID:
18345056
11.
12.

Preparation of silica thin films by novel wet process and study of their optical properties.

Im SH, Kim NJ, Kim DH, Hwang CW, Yoon DK, Ryu BK.

J Nanosci Nanotechnol. 2012 Feb;12(2):1453-6.

PMID:
22629977
13.

Crystal phase transition of HfO2 films evaporated by plasma-ion-assisted deposition.

Wang J, Maier RL, Schreiber H.

Appl Opt. 2008 May 1;47(13):C189-92.

PMID:
18449245
14.

EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates.

Schröder S, Feigl T, Duparré A, Tünnermann A.

Opt Express. 2007 Oct 17;15(21):13997-4012.

PMID:
19550673
15.

Far-ultraviolet reflectance measurements and optical constants of unoxidized aluminum films.

Larruquert JI, Méndez JA, Aznárez JA.

Appl Opt. 1995 Aug 1;34(22):4892-9. doi: 10.1364/AO.34.004892.

PMID:
21052330
16.

Large-angle in-plane light scattering from rough surfaces.

Karabacak T, Zhao Y, Stowe M, Quayle B, Wang GC, Lu TM.

Appl Opt. 2000 Sep 1;39(25):4658-68.

PMID:
18350057
17.

Spray-layer-by-layer assembly can more rapidly produce optical-quality multistack heterostructures.

Nogueira GM, Banerjee D, Cohen RE, Rubner MF.

Langmuir. 2011 Jun 21;27(12):7860-7. doi: 10.1021/la200790g. Epub 2011 May 17.

PMID:
21591635
18.

Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation.

Ristau D, Günster S, Bosch S, Duparré A, Masetti E, Ferré-Borrull J, Kiriakidis G, Peiró F, Quesnel E, Tikhonravov A.

Appl Opt. 2002 Jun 1;41(16):3196-204.

PMID:
12064402
19.

Relation between light scattering and the microstructure of optical thin films.

Duparré A, Kassam S.

Appl Opt. 1993 Oct 1;32(28):5475-80. doi: 10.1364/AO.32.005475.

PMID:
20856358
20.

Combination of surface characterization techniques for investigating optical thin-film components.

Duparré A, Jakobs S.

Appl Opt. 1996 Sep 1;35(25):5052-8. doi: 10.1364/AO.35.005052.

PMID:
21102935

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