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Items: 1 to 20 of 159

1.

Mold Fabrication for 3D Dual Damascene Imprinting.

Saydur Rahman SM, Cui B.

Nanoscale Res Lett. 2010 Jan 30;5(3):545-549.

2.

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.

Grigorescu AE, Hagen CW.

Nanotechnology. 2009 Jul 22;20(29):292001. doi: 10.1088/0957-4484/20/29/292001. Review.

PMID:
19567961
3.

Effect of post exposure bake in inorganic electron beam resist and utilizing for nanoimprint mold.

Shizuno M, Taniguchi J, Ogino K, Ishikawa K.

J Nanosci Nanotechnol. 2009 Jan;9(1):562-6.

PMID:
19441350
4.

Circuit fabrication at 17 nm half-pitch by nanoimprint lithography.

Jung GY, Johnston-Halperin E, Wu W, Yu Z, Wang SY, Tong WM, Li Z, Green JE, Sheriff BA, Boukai A, Bunimovich Y, Heath JR, Williams RS.

Nano Lett. 2006 Mar;6(3):351-4.

PMID:
16522021
5.

Self-aligned memristor cross-point arrays fabricated with one nanoimprint lithography step.

Xia Q, Yang JJ, Wu W, Li X, Williams RS.

Nano Lett. 2010 Aug 11;10(8):2909-14. doi: 10.1021/nl1017157.

PMID:
20590084
6.

Sub-50 nm template fabrications for nanoimprint lithography using hydrogen silsesquioxane and silicon nitride.

Shim JY, Baek KH, Park KS, Shin HS, No KS, Lee K, Do LM.

J Nanosci Nanotechnol. 2010 May;10(5):3628-30.

PMID:
20359014
7.

Quantized patterning using nanoimprinted blanks.

Chou SY, Li WD, Liang X.

Nanotechnology. 2009 Apr 15;20(15):155303. doi: 10.1088/0957-4484/20/15/155303.

PMID:
19420545
8.
9.

Pattern size reduction effect via a "mix and match" sequential imprinting technique.

Chong KS, Low HY.

Langmuir. 2009 Jun 2;25(11):6559-64. doi: 10.1021/la8038895.

PMID:
19405476
10.

Silylcarborane acrylate nanoimprint lithography resists.

Simon YC, Moran IW, Carter KR, Coughlin EB.

ACS Appl Mater Interfaces. 2009 Sep;1(9):1887-92. doi: 10.1021/am9002292.

PMID:
20355810
11.
12.

Fabrication of 70 nm-sized zero residual polymer patterns by thermal nanoimprint lithography.

Yang KY, Kim JW, Byeon KJ, Lee HC, Lee H.

J Nanosci Nanotechnol. 2009 Jul;9(7):4194-6.

PMID:
19916428
13.

Nanoscale patterning by UV nanoimprint lithography using an organometallic resist.

Acikgoz C, Vratzov B, Hempenius MA, Vancso GJ, Huskens J.

ACS Appl Mater Interfaces. 2009 Nov;1(11):2645-50. doi: 10.1021/am9005379.

PMID:
20356138
14.
15.

Combined laser interference and photolithography patterning of a hybrid mask mold for nanoimprint lithography.

Ahn S, Choi J, Kim E, Dong KY, Jeon H, Ju BK, Lee KB.

J Nanosci Nanotechnol. 2011 Jul;11(7):6039-43.

PMID:
22121654
16.

Sub-20-nm alignment in nanoimprint lithography using Moiré fringe.

Li N, Wu W, Chou SY.

Nano Lett. 2006 Nov;6(11):2626-9.

PMID:
17090103
17.

The fabrication scheme of a high resolution and high aspect ratio UV-nanoimprint mold.

Lim K, Wi JS, Nam SW, Park SY, Lee JJ, Kim KB.

Nanotechnology. 2009 Dec 9;20(49):495303. doi: 10.1088/0957-4484/20/49/495303.

PMID:
19893150
18.

Nanopantography: a new method for massively parallel nanopatterning over large areas.

Xu L, Vemula SC, Jain M, Nam SK, Donnelly VM, Economou DJ, Ruchhoeft P.

Nano Lett. 2005 Dec;5(12):2563-8.

PMID:
16351216
19.

Deformation of nanostructures on polymer molds during soft UV nanoimprint lithography.

Gilles S, Diez M, Offenhäusser A, Lensen MC, Mayer D.

Nanotechnology. 2010 Jun 18;21(24):245307. doi: 10.1088/0957-4484/21/24/245307.

PMID:
20498521
20.

Shot noise in electron-beam lithography and line-width measurements.

Kruit P, Steenbrink SW.

Scanning. 2006 Jan-Feb;28(1):20-6.

PMID:
16502622
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