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Items: 1 to 20 of 95

1.

Robust pattern transfer of nanoimprinted features for sub-5-nm fabrication.

Schvartzman M, Wind SJ.

Nano Lett. 2009 Oct;9(10):3629-34. doi: 10.1021/nl9018512.

2.

A study on the fabrication of nanostructures with high aspect ratio and large area uniformity.

Sun T, Xut Z, Wang S, Zhao W, Wu X, Liu S, Liu W, Peng J, Wang Z, Zhang X, He J.

J Nanosci Nanotechnol. 2013 Mar;13(3):1871-5.

PMID:
23755609
3.

Fabrication of Nanoscale Bioarrays for the Study of Cytoskeletal Protein Binding Interactions Using Nanoimprint Lithography.

Schvartzman M, Nguyen K, Palma M, Abramson J, Sable J, Hone J, Sheetz MP, Wind SJ.

J Vac Sci Technol B Microelectron Nanometer Struct Process Meas Phenom. 2009 Jan 1;27(1):61-65.

4.

The fabrication scheme of a high resolution and high aspect ratio UV-nanoimprint mold.

Lim K, Wi JS, Nam SW, Park SY, Lee JJ, Kim KB.

Nanotechnology. 2009 Dec 9;20(49):495303. doi: 10.1088/0957-4484/20/49/495303. Epub 2009 Nov 6.

PMID:
19893150
5.

Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.

Grigorescu AE, Hagen CW.

Nanotechnology. 2009 Jul 22;20(29):292001. doi: 10.1088/0957-4484/20/29/292001. Epub 2009 Jul 1. Review.

PMID:
19567961
6.

Effect of post exposure bake in inorganic electron beam resist and utilizing for nanoimprint mold.

Shizuno M, Taniguchi J, Ogino K, Ishikawa K.

J Nanosci Nanotechnol. 2009 Jan;9(1):562-6.

PMID:
19441350
7.

Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing.

Xiong S, Wan L, Ishida Y, Chapuis YA, Craig GS, Ruiz R, Nealey PF.

ACS Nano. 2016 Aug 23;10(8):7855-65. doi: 10.1021/acsnano.6b03667. Epub 2016 Aug 10.

PMID:
27482932
8.

Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media.

Yang X, Xiao S, Hu W, Hwu J, van de Veerdonk R, Wago K, Lee K, Kuo D.

Nanotechnology. 2014 Oct 3;25(39):395301. doi: 10.1088/0957-4484/25/39/395301. Epub 2014 Sep 5.

PMID:
25189432
9.

High aspect ratio nano-fabrication of photonic crystal structures on glass wafers using chrome as hard mask.

Hossain MN, Justice J, Lovera P, McCarthy B, O'Riordan A, Corbett B.

Nanotechnology. 2014 Sep 5;25(35):355301. doi: 10.1088/0957-4484/25/35/355301. Epub 2014 Aug 12.

PMID:
25116111
10.
11.

Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices.

Peroz C, Dhuey S, Volger M, Wu Y, Olynick D, Cabrini S.

Nanotechnology. 2010 Nov 5;21(44):445301. doi: 10.1088/0957-4484/21/44/445301. Epub 2010 Oct 5.

PMID:
20921594
12.

Templated assembly of metal nanoparticles in nanoimprinted patterns for metal nanowire fabrication.

Kim EU, Baeg KJ, Noh YY, Kim DY, Lee T, Park I, Jung GY.

Nanotechnology. 2009 Sep 2;20(35):355302. doi: 10.1088/0957-4484/20/35/355302. Epub 2009 Aug 11.

PMID:
19671958
13.

Super-selective cryogenic etching for sub-10 nm features.

Liu Z, Wu Y, Harteneck B, Olynick D.

Nanotechnology. 2013 Jan 11;24(1):015305. doi: 10.1088/0957-4484/24/1/015305. Epub 2012 Dec 7.

PMID:
23220824
14.

Thermal probe maskless lithography for 27.5 nm half-pitch Si technology.

Cheong LL, Paul P, Holzner F, Despont M, Coady DJ, Hedrick JL, Allen R, Knoll AW, Duerig U.

Nano Lett. 2013 Sep 11;13(9):4485-91. doi: 10.1021/nl4024066. Epub 2013 Aug 23.

PMID:
23965001
15.

Sub-50 nm template fabrications for nanoimprint lithography using hydrogen silsesquioxane and silicon nitride.

Shim JY, Baek KH, Park KS, Shin HS, No KS, Lee K, Do LM.

J Nanosci Nanotechnol. 2010 May;10(5):3628-30.

PMID:
20359014
16.

Durable diamond-like carbon templates for UV nanoimprint lithography.

Tao L, Ramachandran S, Nelson CT, Lin M, Overzet LJ, Goeckner M, Lee G, Willson CG, Wu W, Hu W.

Nanotechnology. 2008 Mar 12;19(10):105302. doi: 10.1088/0957-4484/19/10/105302. Epub 2008 Feb 13.

PMID:
21817695
17.

Silicon dioxide mask by plasma enhanced atomic layer deposition in focused ion beam lithography.

Liu Z, Shah A, Alasaarela T, Chekurov N, Savin H, Tittonen I.

Nanotechnology. 2017 Feb 24;28(8):085303. doi: 10.1088/1361-6528/aa5650. Epub 2017 Jan 3.

PMID:
28045005
18.

Ultrasmall structure fabrication via a facile size modification of nanoimprinted functional silsesquioxane features.

Pina-Hernandez C, Fu PF, Guo LJ.

ACS Nano. 2011 Feb 22;5(2):923-31. doi: 10.1021/nn102127z. Epub 2011 Jan 6.

PMID:
21210695
19.

Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry.

Chen X, Liu S, Zhang C, Jiang H, Ma Z, Sun T, Xu Z.

Opt Express. 2014 Jun 16;22(12):15165-77. doi: 10.1364/OE.22.015165.

PMID:
24977609
20.

Fabrication of high aspect ratio tungsten nanostructures on ultrathin c-Si membranes for extreme UV applications.

Delachat F, Le Drogoff B, Constancias C, Delprat S, Gautier E, Chaker M, Margot J.

Nanotechnology. 2016 Jan 15;27(2):025304. doi: 10.1088/0957-4484/27/2/025304. Epub 2015 Dec 2.

PMID:
26630379

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