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Items: 1 to 20 of 103

1.

Synthesis of silicon nanowires and nanofin arrays using interference lithography and catalytic etching.

Choi WK, Liew TH, Dawood MK, Smith HI, Thompson CV, Hong MH.

Nano Lett. 2008 Nov;8(11):3799-802. doi: 10.1021/nl802129f. Epub 2008 Oct 28.

PMID:
18954118
2.

Periodic si nanopillar arrays fabricated by colloidal lithography and catalytic etching for broadband and omnidirectional elimination of Fresnel reflection.

Wang HP, Lai KY, Lin YR, Lin CA, He JH.

Langmuir. 2010 Aug 3;26(15):12855-8. doi: 10.1021/la1012507.

PMID:
20666420
3.

Sub-100 nm silicon nanowires by laser interference lithography and metal-assisted etching.

de Boor J, Geyer N, Wittemann JV, Gösele U, Schmidt V.

Nanotechnology. 2010 Mar 5;21(9):095302. doi: 10.1088/0957-4484/21/9/095302. Epub 2010 Jan 29.

PMID:
20110585
4.

Fabrication of p-type silicon nanowire arrays with a high aspect ratio using electrochemical and alkaline etching.

Jang HS, Choi HJ, Kim JH.

J Nanosci Nanotechnol. 2012 Apr;12(4):3567-70.

PMID:
22849170
5.

Fabrication of large number density platinum nanowire arrays by size reduction lithography and nanoimprint lithography.

Yan XM, Kwon S, Contreras AM, Bokor J, Somorjai GA.

Nano Lett. 2005 Apr;5(4):745-8.

PMID:
15826120
6.

Ordered arrays of vertically aligned [110] silicon nanowires by suppressing the crystallographically preferred <100> etching directions.

Huang Z, Shimizu T, Senz S, Zhang Z, Zhang X, Lee W, Geyer N, Gösele U.

Nano Lett. 2009 Jul;9(7):2519-25. doi: 10.1021/nl803558n.

PMID:
19480399
7.

Large-area pattern transfer of metallic nanostructures on glass substrates via interference lithography.

Du K, Wathuthanthri I, Mao W, Xu W, Choi CH.

Nanotechnology. 2011 Jul 15;22(28):285306. doi: 10.1088/0957-4484/22/28/285306. Epub 2011 Jun 6.

PMID:
21642762
8.

Directed positioning of single cells in microwells fabricated by scanning probe lithography and wet etching methods.

Choi I, Yang YI, Kim YJ, Kim Y, Hahn JS, Choi K, Yi J.

Langmuir. 2008 Mar 18;24(6):2597-602. doi: 10.1021/la701679a. Epub 2008 Jan 29.

PMID:
18225920
9.

Nickel silicide nanostructures transformed from site-specific silicon nanostructures.

Luo Q, Wang Q, Gu CZ.

J Nanosci Nanotechnol. 2009 Feb;9(2):1548-50.

PMID:
19441567
10.

Fabrication of large-area ferromagnetic arrays using etched nanosphere lithography.

Weekes SM, Ogrin FY, Murray WA.

Langmuir. 2004 Dec 7;20(25):11208-12.

PMID:
15568877
11.

Electrochemical synthesis of highly ordered nanowires with a rectangular cross section using an in-plane nanochannel array.

Sergelius P, Moreno JM, Rahimi W, Waleczek M, Zierold R, Görlitz D, Nielsch K.

Nanotechnology. 2014 Dec 19;25(50):504002. doi: 10.1088/0957-4484/25/50/504002. Epub 2014 Nov 26.

PMID:
25426643
12.

Controlling the Geometries of Si Nanowires through Tunable Nanosphere Lithography.

Li L, Fang Y, Xu C, Zhao Y, Wu K, Limburg C, Jiang P, Ziegler KJ.

ACS Appl Mater Interfaces. 2017 Mar 1;9(8):7368-7375. doi: 10.1021/acsami.6b09959. Epub 2017 Feb 14.

PMID:
28067037
13.
14.

The fabrication of high-aspect-ratio, size-tunable nanopore arrays by modified nanosphere lithography.

Chen X, Wei X, Jiang K.

Nanotechnology. 2009 Oct 21;20(42):425605. doi: 10.1088/0957-4484/20/42/425605. Epub 2009 Sep 25.

PMID:
19779228
15.

Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scale.

Ho JW, Wee Q, Dumond J, Tay A, Chua SJ.

Nanoscale Res Lett. 2013 Dec 1;8(1):506. doi: 10.1186/1556-276X-8-506.

16.

Multi-silicon ridge nanofabrication by repeated edge lithography.

Zhao Y, Berenschot E, Jansen H, Tas N, Huskens J, Elwenspoek M.

Nanotechnology. 2009 Aug 5;20(31):315305. doi: 10.1088/0957-4484/20/31/315305. Epub 2009 Jul 13.

PMID:
19597243
17.

Fabrication of 150 nm half-pitch grating templates for nanoimprint lithography.

Xie SQ, Lu BR, Sun Y, Chen Y, Qu XP, Liu R.

J Nanosci Nanotechnol. 2009 Feb;9(2):1437-40.

PMID:
19441541
18.

Facile fabrication of silver nanofin array via electroless plating.

Miyoshi K, Aoki Y, Kunitake T, Fujikawa S.

Langmuir. 2008 Apr 15;24(8):4205-8. doi: 10.1021/la703512w. Epub 2008 Mar 1.

PMID:
18312009
19.

Formation of silicon nanostructures with a combination of spacer technology and deep reactive ion etching.

Bien DC, Lee HW, Badaruddin SA.

Nanoscale Res Lett. 2012 Jun 6;7(1):288. doi: 10.1186/1556-276X-7-288.

20.

Color filter incorporating a subwavelength patterned grating in poly silicon.

Yoon YT, Lee HS, Lee SS, Kim SH, Park JD, Lee KD.

Opt Express. 2008 Feb 18;16(4):2374-80.

PMID:
18542315

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