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Page 1
Reaction Mechanism Underlying Atomic Layer Deposition of Antimony Telluride Thin Films.
J Nanosci Nanotechnol. 2016 May;16(5):4924-8. doi: 10.1166/jnn.2016.12270.
J Nanosci Nanotechnol. 2016.
PMID: 27483847
Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(NtBu)(NEt2)3, Ta(NtBu)(NEt2)2Cp, and H2O.
Song SJ, Park T, Yoon KJ, Yoon JH, Kwon DE, Noh W, Lansalot-Matras C, Gatineau S, Lee HK, Gautam S, Cho DY, Lee SW, Hwang CS.
Song SJ, et al. Among authors: lansalot matras c.
ACS Appl Mater Interfaces. 2017 Jan 11;9(1):537-547. doi: 10.1021/acsami.6b11613. Epub 2016 Dec 20.
ACS Appl Mater Interfaces. 2017.
PMID: 27936581
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Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer.
Song JG, Ryu GH, Lee SJ, Sim S, Lee CW, Choi T, Jung H, Kim Y, Lee Z, Myoung JM, Dussarrat C, Lansalot-Matras C, Park J, Choi H, Kim H.
Song JG, et al. Among authors: lansalot matras c.
Nat Commun. 2015 Jul 23;6:7817. doi: 10.1038/ncomms8817.
Nat Commun. 2015.
PMID: 26204328
Free PMC article.
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Layer-controlled, wafer-scale, and conformal synthesis of tungsten disulfide nanosheets using atomic layer deposition.
Song JG, Park J, Lee W, Choi T, Jung H, Lee CW, Hwang SH, Myoung JM, Jung JH, Kim SH, Lansalot-Matras C, Kim H.
Song JG, et al. Among authors: lansalot matras c.
ACS Nano. 2013 Dec 23;7(12):11333-40. doi: 10.1021/nn405194e. Epub 2013 Nov 27.
ACS Nano. 2013.
PMID: 24252136
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