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Items: 9


Synergetic Tuning of the Electrical and Thermal Transport Properties via Pb/Ag Dual Doping in BiCuSeO.

Li F, Zheng Z, Chang Y, Ruan M, Ge Z, Chen Y, Fan P.

ACS Appl Mater Interfaces. 2019 Dec 11;11(49):45737-45745. doi: 10.1021/acsami.9b16723. Epub 2019 Nov 27.


Effect of Graphene Oxide Nano-Sheets on Structural, Morphological and Photocatalytic Activity of BiFeO3-Based Nanostructures.

Irfan S, Liang GX, Li F, Chen YX, Rizwan S, Jin J, Zhuanghao Z, Ping F.

Nanomaterials (Basel). 2019 Sep 19;9(9). pii: E1337. doi: 10.3390/nano9091337.


Thermoelectric Properties of Tin Telluride Quasi Crystal Grown by Vertical Bridgman Method.

Chen YX, Li F, Li D, Zheng Z, Luo J, Fan P.

Materials (Basel). 2019 Sep 16;12(18). pii: E3001. doi: 10.3390/ma12183001.


Influence of Refractive Index on Antireflectance Efficiency of Thin Films.

Khan SB, Irfan S, Zhuanghao Z, Lee SL.

Materials (Basel). 2019 May 7;12(9). pii: E1483. doi: 10.3390/ma12091483.


High-Quality Perovskite CH₃NH₃PbI₃ Thin Films for Solar Cells Prepared by Single-Source Thermal Evaporation Combined with Solvent Treatment.

Peng H, Su Z, Zheng Z, Lan H, Luo J, Fan P, Liang G.

Materials (Basel). 2019 Apr 15;12(8). pii: E1237. doi: 10.3390/ma12081237.


Enhanced Charge Extraction of Li-Doped TiO₂ for Efficient Thermal-Evaporated Sb₂S₃ Thin Film Solar Cells.

Lan C, Luo J, Lan H, Fan B, Peng H, Zhao J, Sun H, Zheng Z, Liang G, Fan P.

Materials (Basel). 2018 Feb 28;11(3). pii: E355. doi: 10.3390/ma11030355.


Enhanced Thermoelectric Properties of Polycrystalline SnSe via LaCl₃ Doping.

Li F, Wang W, Ge ZH, Zheng Z, Luo J, Fan P, Li B.

Materials (Basel). 2018 Jan 28;11(2). pii: E203. doi: 10.3390/ma11020203.


A new type of glucose biosensor based on surface acoustic wave resonator using Mn-doped ZnO multilayer structure.

Luo J, Luo P, Xie M, Du K, Zhao B, Pan F, Fan P, Zeng F, Zhang D, Zheng Z, Liang G.

Biosens Bioelectron. 2013 Nov 15;49:512-8. doi: 10.1016/j.bios.2013.05.021. Epub 2013 Jun 12.


Influence of plasma treatment on laser-induced damage characters of HfO2 thin films at 355 nm.

Zhang D, Wang C, Fan P, Cai X, Zheng Z, Shao J, Fan Z.

Opt Express. 2009 May 11;17(10):8246-52.


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