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ACS Appl Mater Interfaces. 2017 Oct 25;9(42):36962-36970. doi: 10.1021/acsami.7b08065. Epub 2017 Oct 16.

Efficient Suppression of Defects and Charge Trapping in High Density In-Sn-Zn-O Thin Film Transistor Prepared using Microwave-Assisted Sputter.

Author information

1
Department of Applied Physics, Korea University , 2511, Sejongro, Sejong, 339-700, Republic of Korea.
2
Department of Material Science and Engineering, Korea Advanced Institute of Science and Technology , 291 Daehakro, Yuseong-gu, Daejeon, 305-701, Republic of Korea.
3
Advanced Vacuum and Clean Equipment Optimizer (AVACO) , Woelam-dong, Dalseo-gu, Daegu, 1107, Republic of Korea.

Abstract

Amorphous oxide semiconductor-based thin film transistors (TFTs) have been considered as excellent switching elements for driving active-matrix organic light-emitting diodes (AMOLED) owing to their high mobility and process compatibility. However, oxide semiconductors have inherent defects, causing fast transient charge trapping and device instability. For the next-generation displays such as flexible, wearable, or transparent displays, an active semiconductor layer with ultrahigh mobility and high reliability at low deposition temperature is required. Therefore, we introduced high density plasma microwave-assisted (MWA) sputtering method as a promising deposition tool for the formation of high density and high-performance oxide semiconductor films. In this paper, we present the effect of the MWA sputtering method on the defects and fast charge trapping in In-Sn-Zn-O (ITZO) TFTs using various AC device characterization methodologies including fast I-V, pulsed I-V, transient current, low frequency noise, and discharge current analysis. Using these methods, we were able to analyze the charge trapping mechanism and intrinsic electrical characteristics, and extract the subgap density of the states of oxide TFTs quantitatively. In comparison to conventional sputtered ITZO, high density plasma MWA-sputtered ITZO exhibits outstanding electrical performance, negligible charge trapping characteristics and low subgap density of states. High-density plasma MWA sputtering method has high deposition rate even at low working pressure and control the ion bombardment energy, resulting in forming low defect generation in ITZO and presenting high performance ITZO TFT. We expect the proposed high density plasma sputtering method to be applicable to a wide range of oxide semiconductor device applications.

KEYWORDS:

In−Sn−Zn-O; charge trapping; defect density; high density plasma; microwave-assisted sputter; oxide semiconductor; reflected Ar; thin film transistor

PMID:
28985054
DOI:
10.1021/acsami.7b08065

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