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Items: 2


The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator-Metal Transition Behavior.

Zhang C, Gunes O, Li Y, Cui X, Mohammadtaheri M, Wen SJ, Wong R, Yang Q, Kasap S.

Materials (Basel). 2019 Jul 5;12(13). pii: E2160. doi: 10.3390/ma12132160.


Hard Cr2O3 coatings on SS316L substrates prepared by reactive magnetron sputtering technique: a potential candidate for orthopedic implants.

Mohammadtaheri M, Li Y, Yang Q.

Environ Sci Pollut Res Int. 2019 Apr 17. doi: 10.1007/s11356-019-05006-3. [Epub ahead of print]


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