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Items: 4

1.

PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases.

Zanders D, Ciftyurek E, Subaşı E, Huster N, Bock C, Kostka A, Rogalla D, Schierbaum K, Devi A.

ACS Appl Mater Interfaces. 2019 Aug 7;11(31):28407-28422. doi: 10.1021/acsami.9b07090. Epub 2019 Jul 24.

PMID:
31339290
2.

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices.

Mai L, Zanders D, Subaşı E, Ciftyurek E, Hoppe C, Rogalla D, Gilbert W, Arcos TL, Schierbaum K, Grundmeier G, Bock C, Devi A.

ACS Appl Mater Interfaces. 2019 Jan 23;11(3):3169-3180. doi: 10.1021/acsami.8b16443. Epub 2019 Jan 9.

PMID:
30624887
3.

Ultrathin TiO(x) films on Pt(111): a LEED, XPS, and STM investigation.

Sedona F, Rizzi GA, Agnoli S, Llabrés i Xamena FX, Papageorgiou A, Ostermann D, Sambi M, Finetti P, Schierbaum K, Granozzi G.

J Phys Chem B. 2005 Dec 29;109(51):24411-26.

PMID:
16375442
4.

Epitaxial TiO2 nanoparticles on Pt(111): a structural study by photoelectron diffraction and scanning tunneling microscopy.

Sedona F, Eusebio M, Rizzi GA, Granozzi G, Ostermann D, Schierbaum K.

Phys Chem Chem Phys. 2005 Feb 21;7(4):697-702.

PMID:
19787888

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