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Items: 3


Atomic Layer Deposition of Buffer Layers for the Growth of Vertically Aligned Carbon Nanotube Arrays.

Li HH, Yuan GJ, Shan B, Zhang XX, Ma HP, Tian YZ, Lu HL, Liu J.

Nanoscale Res Lett. 2019 Apr 2;14(1):119. doi: 10.1186/s11671-019-2947-5.


Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO₂ Super-Lattice.

Ma HP, Yang JH, Yang JG, Zhu LY, Huang W, Yuan GJ, Feng JJ, Jen TC, Lu HL.

Nanomaterials (Basel). 2019 Jan 3;9(1). pii: E55. doi: 10.3390/nano9010055.


Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition.

Ma HP, Lu HL, Yang JH, Li XX, Wang T, Huang W, Yuan GJ, Komarov FF, Zhang DW.

Nanomaterials (Basel). 2018 Dec 5;8(12). pii: E1008. doi: 10.3390/nano8121008.

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