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Items: 2

1.

Teflon/SiO₂ Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process.

Fan CL, Shang MC, Li BJ, Lin YZ, Wang SJ, Lee WD, Hung BR.

Materials (Basel). 2015 Apr 13;8(4):1704-1713. doi: 10.3390/ma8041704.

2.

A Self-Aligned a-IGZO Thin-Film Transistor Using a New Two-Photo-Mask Process with a Continuous Etching Scheme.

Fan CL, Shang MC, Li BJ, Lin YZ, Wang SJ, Lee WD.

Materials (Basel). 2014 Aug 11;7(8):5761-5768. doi: 10.3390/ma7085761.

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