Thermally induced interface degradation in (111) Si/SiO2 traced by electron spin resonance
Phys Rev B Condens Matter
.
1996 Oct 15;54(16):R11129-R11132.
doi: 10.1103/physrevb.54.r11129.
Authors
A Stesmans
,
VV Afanas'ev
PMID:
9985003
DOI:
10.1103/physrevb.54.r11129
No abstract available