Focusing light through highly scattering materials by modifying the phase profile of the illuminating beam has attracted a great deal of attention in the past decade paving the way towards novel applications. Here we report on a tradeoff between two seemingly independent quantities of critical importance in the focusing process: the size of the focal point obtained behind a scattering medium and the maximum achievable intensity of such focal point. We theoretically derive and experimentally demonstrate the practical limits of intensity enhancement of the focal point and relate them to the intrinsic properties of the scattering phenomenon. We demonstrate that the intensity enhancement limitation becomes dominant when the focusing plane gets closer to the scattering layer thus limiting the ability to obtain tight focusing at high contrast, which has direct relevance for the many applications exploring scattering materials as a platform for high resolution focusing and imaging.