Send to

Choose Destination
Sci Total Environ. 2019 Apr 20;662:205-217. doi: 10.1016/j.scitotenv.2019.01.180. Epub 2019 Jan 16.

Utilization of nanomaterials for in-situ remediation of heavy metal(loid) contaminated sediments: A review.

Author information

School of Civil Engineering, Guangzhou University, Guangzhou 510006, China.
School of Civil Engineering, Guangzhou University, Guangzhou 510006, China. Electronic address:
Guangdong Key Laboratory of Integrated Agro-environmental Pollution Control and Management, Guangdong Institute of Eco-environmental Science & Technology, Guangzhou 510650, China.


Heavy metal(loid)s are toxic and non-biodegradable environmental pollutants. The contamination of sediments with heavy metal(loid)s has attracted increasing attention due to the negative environmental effects of heavy metal(loid)s and the development of new remediation techniques for metal(loid) contaminated sediments. As a result of rapid nanotechnology development, nanomaterials are also being increasingly utilized for the remediation of contaminated sediments due to their excellent capacity of immobilizing/adsorbing metal(loid) ions. This review summarizes recent studies that have used various nanomaterials such as nanoscale zero-valent iron (nZVI), stabilizer-modified nZVI, nano apatite based-materials including nano-hydroxyapatite particles (nHAp) and stabilized nano-chlorapatite (nCLAP), carbon nanotubes (CNTs), and titanium dioxide nanoparticles (TiO2 NPs) for the remediation of heavy metal(loid) contaminated sediments. We also review the analysis of potential mechanisms involved in the interaction of nanomaterials with metal(loid) ions. Subsequently, we discuss the factors affecting the nanoparticle-heavy metal(loid)s interaction, the environmental impacts resulting from the application of nanomaterials, the knowledge gaps, and potential future research.


Environmental impacts; Heavy metal(loid)s; Mechanisms; Nanomaterials; Sediment remediation

Supplemental Content

Full text links

Icon for Elsevier Science
Loading ...
Support Center