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Nanomaterials (Basel). 2018 Oct 13;8(10). pii: E827. doi: 10.3390/nano8100827.

Pure Anatase Phase Titanium Dioxide Films Prepared by Mist Chemical Vapor Deposition.

Author information

1
School of Systems Engineering, Kochi University of Technology, Kami, Kochi 782-8502, Japan. 216005z@gs.kochi-tech.ac.jp.
2
School of Systems Engineering, Kochi University of Technology, Kami, Kochi 782-8502, Japan. li.chaoyang@kochi-tech.ac.jp.
3
Center for Nanotechnology, Kochi University of Technology, Kami, Kochi 782-8502, Japan. li.chaoyang@kochi-tech.ac.jp.

Abstract

In this research, pure anatase phase titanium dioxide thin films were successfully fabricated for the first time using the mist chemical vapor deposition method, and optional values for deposition temperature and concentration of titanium tetraisopropoxide were established. It was found that the crystallinity of the titanium dioxide film was significantly improved by increasing the deposition temperature. The best crystallinity of titanium dioxide film was obtained at 400 °C. It was confirmed that pure anatase phase titanium dioxide films could be obtained using different concentrations of titanium tetraisopropoxide. The lower concentration of titanium tetraisopropoxide produced better crystallinity in the resultant titanium dioxide film. The morphologies of the titanium dioxide thin films were also significantly influenced by the concentration of titanium tetraisopropoxide in the precursor solution.

KEYWORDS:

anatase; growth control; mist chemical vapor deposition; thin films; titanium dioxide

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