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Materials (Basel). 2018 Mar 30;11(4). pii: E530. doi: 10.3390/ma11040530.

Ridge Minimization of Ablated Morphologies on ITO Thin Films Using Squared Quasi-Flat Top Beam.

Kim HY1,2, Jeon JW3, Choi W4,5, Shin YG6,7, Ji SY8,9, Cho SH10,11.

Author information

1
Department of Laser & Electron Beam Application, Korea Institute of Machinery & Material (KIMM), 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea. hykim@kimm.re.kr.
2
Department of Nano-Mechatronics, Korea University of Science & Technology (UST), 176 Gajung-dong, Yuseong-gu, Daejeon 305-343, Korea. hykim@kimm.re.kr.
3
Department of Laser & Electron Beam Application, Korea Institute of Machinery & Material (KIMM), 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea. jwj@kimm.re.kr.
4
Department of Laser & Electron Beam Application, Korea Institute of Machinery & Material (KIMM), 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea. cws@kimm.re.kr.
5
Department of Nano-Mechatronics, Korea University of Science & Technology (UST), 176 Gajung-dong, Yuseong-gu, Daejeon 305-343, Korea. cws@kimm.re.kr.
6
Department of Laser & Electron Beam Application, Korea Institute of Machinery & Material (KIMM), 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea. sinyg90@kimm.re.kr.
7
Department of Nano-Mechatronics, Korea University of Science & Technology (UST), 176 Gajung-dong, Yuseong-gu, Daejeon 305-343, Korea. sinyg90@kimm.re.kr.
8
Department of Laser & Electron Beam Application, Korea Institute of Machinery & Material (KIMM), 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea. ji10047@kimm.re.kr.
9
Department of Nano-Mechatronics, Korea University of Science & Technology (UST), 176 Gajung-dong, Yuseong-gu, Daejeon 305-343, Korea. ji10047@kimm.re.kr.
10
Department of Laser & Electron Beam Application, Korea Institute of Machinery & Material (KIMM), 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea. shcho@kimm.re.kr.
11
Department of Nano-Mechatronics, Korea University of Science & Technology (UST), 176 Gajung-dong, Yuseong-gu, Daejeon 305-343, Korea. shcho@kimm.re.kr.

Abstract

In this study, we explore the improvements in pattern quality that was obtained with a femtosecond laser with quasi-flat top beam profiles at the ablated edge of indium tin oxide (ITO) thin films for the patterning of optoelectronic devices. To ablate the ITO thin films, a femtosecond laser is used that has a wavelength and pulse duration of 1030 nm and 190 fs, respectively. The squared quasi-flat top beam is obtained from a circular Gaussian beam using slits with varying x-y axes. Then, the patterned ITO thin films are measured using both scanning electron and atomic force microscopes. In the case of the Gaussian beam, the ridge height and width are approximately 39 nm and 1.1 μm, respectively, whereas, when the quasi-flat top beam is used, the ridge height and width are approximately 7 nm and 0.25 μm, respectively.

KEYWORDS:

ITO thin film; ablation; femtosecond laser; ridge minimization; slit

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