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Nano Lett. 2017 Dec 13;17(12):7620-7628. doi: 10.1021/acs.nanolett.7b03613. Epub 2017 Nov 8.

Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space.

Author information

1
Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research) , 2 Fusionopolis Way, #08-03 Innovis, 138634 Singapore.
2
Data Storage Institute, A*STAR (Agency for Science, Technology and Research) , 2 Fusionopolis Way, #08-01 Innovis, 138634 Singapore.
3
Singapore University of Technology and Design , 8 Somapah Road, 487372, Singapore.

Abstract

Localized optical resonances in metallic nanostructures have been increasingly used in color printing, demonstrating unprecedented resolution but limited in color gamut. Here, we introduce a new nanostructure design, which broadens the gamut while retaining print resolution. Instead of metals, silicon nanostructures that exhibit localized magnetic and electric dipole resonances were fabricated on a silicon substrate coated with a Si3N4 index matching layer. Index matching allows a suppression of substrate effects, thus enabling Kerker's conditions to be met, that is, sharpened transitions in the reflectance spectra leading to saturated colors. This nanostructure design achieves a color gamut superior to sRGB, and is compatible with CMOS processes. The presented design could enable compact high-resolution color displays and filters, and the use of a Si3N4 antireflection coating can be readily extended to designs with nanostructures fabricated using other high-index materials.

KEYWORDS:

High-resolution color printing; Kerker’s conditions; Mie resonance; antireflection coating; highly saturated colors; silicon nanostructures

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