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Adv Mater. 2016 Oct;28(38):8439-8445. doi: 10.1002/adma.201602523. Epub 2016 Aug 4.

Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly.

Author information

1
National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. hjjeon@nnfc.re.kr.
2
Department of Nano-structured Materials Research, Korea National Nanofab Center, Daejeon, 305-701, Republic of Korea. hjjeon@nnfc.re.kr.
3
National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.
4
Power Control Device Research Section, Electronics and Telecommunications Research Institute (ETRI), Daejeon, 305-700, Republic of Korea.
5
National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.
6
Soft Innovative Materials Research Center, Korea Institute of Science and Technology (KIST), Wanju-gun, Jeollabuk-do, 565-905, Republic of Korea.
7
Advanced Functional Materials Research Group, Korea Research Institute of Chemical Technology (KRICT), Daejeon, 305-600, Republic of Korea.
8
Advanced Photonic Materials and Devices Laboratory, Department of National Research Laboratory, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. qubit@kaist.ac.kr.
9
National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science & Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. sangouk.kim@kaist.ac.kr.
10
National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21 plus), Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea. heetae@kaist.ac.kr.

Abstract

High-resolution (10 nm), high-areal density, high-aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary-sputtering phenomenon during the Ar-ion-bombardment process. This approach provides a foundation for the design of new routes to BCP lithography.

KEYWORDS:

block copolymers; high aspect ratio; high resolution; plasma reaction; secondary sputtering

PMID:
27488974
DOI:
10.1002/adma.201602523

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