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Sci Rep. 2016 Apr 11;6:24143. doi: 10.1038/srep24143.

Tailored CVD graphene coating as a transparent and flexible gas barrier.

Author information

1
Soft Innovative Materials Research Center, Korea Institute of Science and Technology, Jeonbuk 565-905, Republic of Korea.
2
Department of Carbon materials, Chonsun University, Gwangju 501-759, Republic of Korea.
3
School of Semiconductor and Chemical Engineering, Semiconductor Physics Research Center, Chonbuk National University, Jeonju 561-756, Republic of Korea.
4
Department of Chemical Engineering, Dong-A University, Nakdong-Daero 550, Saha-gu, Busan 604-714, Republic of Korea.
5
Photoelectronic Hybrid Research Center, Korea Institute of Science and Technology, Seoul 136-791, Republic of Korea.

Abstract

The chemical vapor deposition (CVD) method to obtain tailored graphene as a transparent and flexible gas barrier has been developed. By separating nucleation step from growth, we could reduce early graphene nucleation density and thus induce better stitching between domain boundaries in the second growth step. Furthermore, two step growth in conjunction with electrochemical polishing of Cu foils achieved large graphene domains and improved graphene quality with minimized defects. The performance of resulting graphene as a gas barrier was superior to the graphene obtained by one-step growth on polished or unpolished Cu foils. The CVD graphene reported here could open up the possibility for exploring graphene-based gas barrier due to the minimized density of defect area.

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