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Soft Matter. 2016 Mar 21;12(11):2914-22. doi: 10.1039/c5sm02829a.

Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates.

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HGST, a Western Digital Company, San Jose Research Center, 3403 Yerba Buena Rd., San Jose, CA 95135, USA.
Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Science, 5625 Renmin Street, Changchun, 130022 China.
IBM Albany NanoTech, 257 Fuller Road, Albany, NY 12203, USA.
Institute for Molecular Engineering, University of Chicago, 5747 South Ellis Avenue, Chicago, IL 60637, USA.


We report a study on directed self-assembly (DSA) with solvent annealing to induce the formation of non-bulk block copolymer microdomains on chemical patterns. Ultrathin films of symmetric polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) display morphologies of PMMA dots, stripes, and PS hexagons with increasing exposure time to acetone vapor, a PMMA-selective solvent. All three nanostructures form long-range-ordered and registered arrays on striped chemical patterns with periods (LS) commensurate to the solvated PS-b-PMMA microdomain period (L0,s). Solvent annealing is shown to facilitate DSA on non-regular chemical patterns, on which the local periods are incommensurate to L0,s. DSA with feature density multiplication, via solvent annealing, is also demonstrated.


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