[Possible Instrument Contamination in the Operating Room During Implantation of Knee and Hip Arthroplasty]

Z Orthop Unfall. 2016 Apr;154(2):157-62. doi: 10.1055/s-0035-1568194. Epub 2016 Feb 4.
[Article in German]

Abstract

Integrated ventilation systems with low turbulence displacement flow (TAV) are generally legally required in the architectural structure of operating theatres. However, it seems that the instruments laid out on sterile covered tables do not have the best possible protection from bacteria. Within an operating theatre, different bacteria counts are possible on the instruments. This prospective controlled study was conducted to demonstrate the influence of instrument tables with integrated horizontal flow on contamination with pathogens in comparison with conventional tables. In an operating theatre (OT) with a ceiling legally appropriate for TAV (2.40 m × 1.20 m), microbiological samples were placed on a table with integrated TAV flow (n = 100) and on a conventional instrument table (n = 100). The routine qualification of the OT was on an ongoing basis and was in accordance with DIN 1946-4: 1999 standards (in accordance with DIN measurement of recovery time 1946-4: 12-2008). This corresponds to the OT of the room class Ib. The results show significant differences between the two tables. The bacteria count and the percentage of contamination were many times higher on the conventional table. It is important to understand that the instruments are not completely protected against contamination after opening the pack and during the operation. Remedial measures are possible to optimise the sterility the instrument table.

MeSH terms

  • Air Microbiology*
  • Equipment Contamination / prevention & control*
  • Equipment Design
  • Equipment Failure Analysis
  • Germany
  • Hip Prosthesis / microbiology
  • Joint Prosthesis / microbiology*
  • Knee Prosthesis / microbiology
  • Operating Rooms
  • Operating Tables / microbiology*
  • Surgical Instruments / microbiology*
  • Ventilation / instrumentation*