Format

Send to

Choose Destination
Lab Chip. 2015 Aug 7;15(15):3163-9. doi: 10.1039/c5lc00626k.

Patterning microfluidic device wettability with spatially-controlled plasma oxidation.

Author information

1
Department of Bioengineering and Therapeutic Sciences, University of California San Francisco, San Francisco, California, USA. adam.abate@ucsf.edu.

Abstract

Microfluidic devices can form double emulsions with uniform properties, but require cumbersome fabrication steps to pattern their wettability. We demonstrate spatially-controlled plasma oxidation to create wettability patterns for forming double emulsions. Our method performs comparably to chemical techniques but is simpler, more reliable, and scalable to patterning large arrays of drop makers.

PMID:
26105774
PMCID:
PMC5531047
DOI:
10.1039/c5lc00626k
[Indexed for MEDLINE]
Free PMC Article

Supplemental Content

Full text links

Icon for Royal Society of Chemistry Icon for PubMed Central
Loading ...
Support Center