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Adv Mater. 2015 Jun 3;27(21):3325-30. doi: 10.1002/adma.201405782. Epub 2015 Apr 21.

Record Charge Carrier Diffusion Length in Colloidal Quantum Dot Solids via Mutual Dot-To-Dot Surface Passivation.

Author information

1
Department of Electrical and Computer Engineering, University of Toronto, 10 King's College Road, Toronto, Ontario, M5S 3G4, Canada.

Abstract

Through a combination of chemical and mutual dot-to-dot surface passivation, high-quality colloidal quantum dot solids are fabricated. The joint passivation techniques lead to a record diffusion length for colloidal quantum dots of 230 ± 20 nm. The technique is applied to create thick photovoltaic devices that exhibit high current density without losing fill factor.

KEYWORDS:

colloidal quantum dots; diffusion length; surface passivation; surface-to-volume ratio

PMID:
25899173
DOI:
10.1002/adma.201405782

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