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Nanoscale Res Lett. 2014 Jun 25;9(1):320. doi: 10.1186/1556-276X-9-320. eCollection 2014.

A review of roll-to-roll nanoimprint lithography.

Author information

1
Nanofabrication and Functional Materials Research Group, School of Mechanical Engineering, Universiti Sains Malaysia, Engineering Campus, Nibong Tebal, Penang 14300, Malaysia.

Abstract

Since its introduction in 1995, nanoimprint lithography has been demonstrated in many researches as a simple, low-cost, and high-throughput process for replicating micro- and nanoscale patterns. Due to its advantages, the nanoimprint lithography method has been rapidly developed over the years as a promising alternative to conventional nanolithography processes to fulfill the demands generated from the recent developments in the semiconductor and flexible electronics industries, which results in variations of the process. Roll-to-roll (R2R) nanoimprint lithography (NIL) is the most demanded technique due to its high-throughput fulfilling industrial-scale application. In the present work, a general literature review on the various types of nanoimprint lithography processes especially R2R NIL and the methods commonly adapted to fabricate imprint molds are presented to provide a clear view and understanding on the nanoimprint lithography technique as well as its recent developments.

PACS:

81.16.Nd.

KEYWORDS:

Lithography; Nanofabrication; Nanoimprint; Nanopatterning; Plate-to-plate; Roll-to-plate; Roll-to-roll

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